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AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry
AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry
Specifications
Brand Name :
ZEIT
Model Number :
ALD-NP-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Size :
Customizable
Guarantee period :
1 year or case by case
Customizable :
Available
Shipping Terms :
By Sea / Air / Multimodal Transport
Description

Atomic Layer Deposition in Nanostructure and Pattern Industry


Applications

Applications Specific Purpose
Nanostructure and pattern

Template-assisted nanostructure
Catalyst-assisted nanostructure
Regioselective ALD for nanopattern preparation


Working Principle
Atomic layer deposition is a method of forming film by making the gaseous phase precursors pulsed alternately
into the reaction chamber and producing the gas-solid phase chemisorption reaction on the deposited substrate
surface. When the precursors reach the surface of the deposited substrate, they will be chemically adsorbed on
the surface and produce the surface reactions.


Features

Model ALD-NP-X—X
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size

Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and carrier gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,
nitrogen, etc.
Note: Customized production available.


Coating Samples

AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern IndustryAL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is
completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.


Our ISO Certification
AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry

Parts Of Our Patents
AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern IndustryAL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry

Parts Of Our Awards and Qualifications of R&D

AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern IndustryAL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry









Product tags

aluminium prototyping

,

how to do aluminium fabrication

,

rapid prototyping aluminum
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AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry

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Product Detail
Brand Name :
ZEIT
Model Number :
ALD-NP-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
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AL2O3 Atomic Layer Deposition Equipment For Nanostructure Pattern Industry

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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