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Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating
Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating
Specifications
Brand Name :
ZEIT
Model Number :
ALD-MEMS-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Size :
Customizable
Guarantee period :
1 year or case by case
Customizable :
Available
Shipping Terms :
By Sea / Air / Multimodal Transport
Description

Atomic Layer Deposition in Micro Electro Mechanical Systems Industry


Applications

Applications Specific Purpose

Micro Electro Mechanical Systems (MEMS)

Anti-wear coating
Anti-adhesion coating
Lubricating coating


Working Principle
A single atomic layer will be deposited in each process cycle. The coating process usually occurs in the reaction
chamber, and the process gases are injected successively. Alternatively, substrate can be transferred between two
zones filled with different precursors (spatial ALD) to realize the process. The entire process,including all reactions
and purging operations, will be repeated again and again until the desired film thickness is realized. The specific
initial phase state is determined by the surface properties of the substrate, and then the film thickness will rise
constantly with the increase of the reaction cycle numbers.So far, the film thickness can be controlled accurately.

Features

Model ALD-MEMS-X—X
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size

Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and carrier gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,
nitrogen, etc.
Note: Customized production available.


Coating Samples
Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating CoatingMicro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating
Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is
completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.

Our ISO Certification
Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating

Parts Of Our Patents
Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating CoatingMicro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating

Parts Of Our Awards and Qualifications of R&D

Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating CoatingMicro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating









Product tags

ed coating process

,

silicon coating machine

,

metallization coating machinery
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Product Detail
Brand Name :
ZEIT
Model Number :
ALD-MEMS-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
video
Micro Electro Mechanical Systems MEMS Atomic Layer Deposition Equipment Lubricating Coating

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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