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Magnetic Head Industry Atomic Layer Deposition ALD Machine OEM
Magnetic Head Industry Atomic Layer Deposition ALD Machine OEM
Specifications
Brand Name :
ZEIT
Model Number :
ALD-MH-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Size :
Customizable
Guarantee period :
1 year or case by case
Customizable :
Available
Shipping Terms :
By Sea / Air / Multimodal Transport
Description

Atomic Layer Deposition in Magnetic Head Industry

Applications

Applications Specific Purpose
Magnetic head

Non-planar deposition insulating spacing layer

Working Principle

Atomic layer deposition technology is that makes the precursors which will be involved in the reaction guided to the

reaction chamber sequentially (one precursor at a time) through different precursor conduits. By means of saturation

chemisorption on the surface of substrate, only one layer of precursor is adsorbed at a time. The excess precursors

and by-products will be purged away by inert gases Ar or N2 to achieve self-limitation.

Features

Model ALD-MH-X—X
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size

Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and carrier gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,

nitrogen, etc.
Note: Customized production available.

Coating Samples

Magnetic Head Industry Atomic Layer Deposition ALD Machine OEMMagnetic Head Industry Atomic Layer Deposition ALD Machine OEM

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is

completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

Magnetic Head Industry Atomic Layer Deposition ALD Machine OEM

Parts Of Our Patents

Magnetic Head Industry Atomic Layer Deposition ALD Machine OEMMagnetic Head Industry Atomic Layer Deposition ALD Machine OEM

Parts Of Our Awards and Qualifications of R&D

Magnetic Head Industry Atomic Layer Deposition ALD Machine OEMMagnetic Head Industry Atomic Layer Deposition ALD Machine OEM

Product tags

aluminium coil manufacturing process

,

aluminum extrusion prototype

,

aluminium extrusion profile machine
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Magnetic Head Industry Atomic Layer Deposition ALD Machine OEM

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Product Detail
Brand Name :
ZEIT
Model Number :
ALD-MH-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
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Magnetic Head Industry Atomic Layer Deposition ALD Machine OEM

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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