MachineU > China Products > Machinery > Food & Beverage Machinery > Nuts Processing Machines > Other Nuts Processing Machines
TiO2 ZnO Atomic Layer Deposition Machine For Energy Industry
TiO2 ZnO Atomic Layer Deposition Machine For Energy Industry
Specifications
Brand Name :
ZEIT
Model Number :
ALD-E-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Size :
Customizable
Guarantee period :
1 year or case by case
Customizable :
Available
Shipping Terms :
By Sea / Air / Multimodal Transport
Description

Atomic Layer Deposition in Energy Industry


Applications

Applications Specific Purpose

Energy

Crystalline silicon solar cells: passivation layer / buffer layer / transparent electrode

Dye-sensitized cells: photo-anode / charge recombination barrier layer
Fuel cells: proton exchange membrane / cathode / electrolyte / catalyst
Lithium ion battery: nanostructure anode / cathode / electrode modified coating

Thermoelectric materials

Electrode material protection layer


Working Principle
There are four steps in the process of atomic layer deposition:
1. Inject first precursor gas into the substrate to have an adsorption reaction with substrate surface.
2. Flush the remaining gas with inert gas.
3. Inject the second precursor gas to have a chemical reaction with the first precursor gas adsorbed on the substrate
surfaceto form film.
4. Inject inert gas again to flush the excess gas away.

Features

Model ALD-E-X—X
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size

Inner diameter: 1200mm, Height: 500mm (Customizable)

Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and carrier gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,
nitrogen, etc.

Note: Customized production available.


Coating Samples
TiO2 ZnO Atomic Layer Deposition Machine For Energy IndustryTiO2 ZnO Atomic Layer Deposition Machine For Energy Industry
Process Step
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is
completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.

Our ISO Certification
TiO2 ZnO Atomic Layer Deposition Machine For Energy Industry

Parts Of Our Patents
TiO2 ZnO Atomic Layer Deposition Machine For Energy IndustryTiO2 ZnO Atomic Layer Deposition Machine For Energy Industry

Parts Of Our Awards and Qualifications of R&D

TiO2 ZnO Atomic Layer Deposition Machine For Energy IndustryTiO2 ZnO Atomic Layer Deposition Machine For Energy Industry





















































Product tags

titanium dioxide manufacturing process

,

zinc oxide manufacturing process

,

titanium dioxide production process
Send your message to this supplier
Send Now

TiO2 ZnO Atomic Layer Deposition Machine For Energy Industry

Ask Latest Price
Watch Video
Product Detail
Brand Name :
ZEIT
Model Number :
ALD-E-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
video
TiO2 ZnO Atomic Layer Deposition Machine For Energy Industry

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
Discover similar products
View More

Find Similar Products By Category:

Supplier Homepage Products Atomic Layer Deposition Equipment
MachineU China Products Machinery Food & Beverage Machinery Nuts Processing Machines Other Nuts Processing Machines
Contact Supplier
Submit Requirement