Specifications
Brand Name :
ZEIT
Model Number :
ALD-O-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Description

Atomic Layer Deposition in Optics Industry


Applications

Applications Specific Purpose

Optics

Optical components

Photonic crystal
Electroluminescent display
Surface-enhanced Raman spectroscopy
Transparent conductive oxide

Luminous layer, passivation layer, filter protection layer, anti-reflective coating, anti-UV
coating


Working Principle
Atomic layer deposition (ALD), originally called atomic layer epitaxy, also called atomic layer chemical vapor
deposition (ALCVD), is a special form of chemical vapor deposition (CVD). This technology can deposit substances
on the surface of substrate in the form of single atomic film layer by layer, which is similar to common chemical
deposition, but in the process of atomic layer deposition, the chemical reaction of a new layer of atomic film is directly
associated with the previous layer, so that only one layer of atoms is deposited in each reaction by this method.

Features

Model ALD-O-X—X
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size

Inner diameter: 1200mm, Height: 500mm (Customizable)

Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and carrier gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,
nitrogen, etc.

Note: Customized production available.


Coating Samples
Photonic Crystal Atomic Layer Deposition Equipment In Optics IndustryPhotonic Crystal Atomic Layer Deposition Equipment In Optics Industry
Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is

completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.

Our ISO Certification
Photonic Crystal Atomic Layer Deposition Equipment In Optics Industry

Parts Of Our Patents
Photonic Crystal Atomic Layer Deposition Equipment In Optics IndustryPhotonic Crystal Atomic Layer Deposition Equipment In Optics Industry

Parts Of Our Awards and Qualifications of R&D

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Brand Name :
ZEIT
Model Number :
ALD-O-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
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Photonic Crystal Atomic Layer Deposition Equipment In Optics Industry

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Total Annual :
$10,000,000-$15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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