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GRH1202 Dry Claw Vacuum Pump 1200 m³/h Oil-Free Industrial Vacuum Pump for Semiconductor CVD Process
GRH1202 Dry Claw Vacuum Pump 1200 m³/h Oil-Free Industrial Vacuum Pump for Semiconductor CVD Process
Specifications
Ultimate Pressure :
≤0.5 Pa
Delivery Time :
30-45 Working Days
Noise :
≤70 dB(A)
Payment Terms :
T/T
Outlet :
KF40
Model Number :
GRH1202
Weight :
220 kg
N2 Purge :
0.2-0.6 MPa, 4-96 L/min
MOQ :
1 Set
Motor Power :
7.5+1.9 kW
Inlet :
ISO100
Dimensions :
821×420×791 mm
Cooling Water :
0.1-0.6 MPa, ≥4.7 L/min
Certification :
ISO9001,ISO14001,ISO45001
Pumping Speed :
1200 m³/h
Brand Name :
Baosi
Price :
Negotiable
Supply Ability :
50 Sets/Month
Packaging Details :
Export Standard Wooden Case Packaging
Voltage :
380V/3-Phase
Place of Origin :
China
Description

GRH1202 Dry Claw Vacuum Pump — 1200 m³/h Oil-Free Industrial Solution

The GRH1202 is a high-performance dry claw vacuum pump from the GRH series, designed for demanding semiconductor, photovoltaic, and lithium battery manufacturing processes. With a pumping speed of 1200 m³/h and ultimate pressure of ≤0.5 Pa, it delivers reliable oil-free vacuum without contamination risk.

Key Features

  • Oil-Free Claw Mechanism: Pump chamber contains no oil or working medium, ensuring clean vacuum suitable for sensitive processes
  • Permanent Magnet Synchronous Motor: Delivers lower energy consumption compared to conventional motors
  • Advanced Rotor Design: Enhanced dust particle handling capability for harsh process environments
  • Dust & Vapor Tolerant: Insensitive to dust and water vapor in pumped gases
  • Compact Footprint: Space-saving design with high system integration (821 * 420 * 791 mm)
  • Comprehensive Protection: Full protection functions with strong self-adaptive capability
  • Low Vibration & Noise: ≤70 dB(A) during operation at ultimate pressure
  • Advanced Sealing: Lip seal and labyrinth seal system combined with nitrogen purge prevents oil contamination
  • Remote Control: I/O interface and RS485 (Modbus protocol) for remote monitoring and control

Technical Specifications

ModelGRH1202
Pumping Speed1200 m³/h
Ultimate Pressure≤0.5 Pa
Motor Power7.5 + 1.9 kW
Voltage380V (3-Phase)
Inlet ConnectionISO100
Outlet ConnectionKF40
Noise Level≤70 dB(A)
Weight220 kg
Dimensions (L*W*H)821 * 420 * 791 mm
Cooling Water Pressure0.1–0.6 MPa
Cooling Water Flow≥4.7 L/min
N₂ Purge Pressure0.2–0.6 MPa
N₂ Purge Flow4–96 L/min
Operating Temperature5–40°C; ≤80% RH

Applications

  • Semiconductor: Etch, Ion Implantation, CVD, ALD, PECVD, MOCVD, SACVD, RTP, HDP-CVD
  • Photovoltaic: Crystal growth furnaces, solar cell manufacturing
  • Lithium Battery: Cell vacuum drying, electrolyte filling, degassing
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GRH1202 Dry Claw Vacuum Pump 1200 m³/h Oil-Free Industrial Vacuum Pump for Semiconductor CVD Process

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Product Detail
Ultimate Pressure :
≤0.5 Pa
Delivery Time :
30-45 Working Days
Noise :
≤70 dB(A)
Payment Terms :
T/T
Outlet :
KF40
Model Number :
GRH1202
Contact Supplier
GRH1202 Dry Claw Vacuum Pump 1200 m³/h Oil-Free Industrial Vacuum Pump for Semiconductor CVD Process

Ningbo Baosi Energy Equipment Co., Ltd.

Verified Supplier
9 Years
zhejiang, ningbo
Since 2005
Business Type :
Manufacturer, Importer, Exporter
Main Products :
Rotary Vane Vacuum Pump, DRV series Two-Stage Oil Rotary Vane Vacuum Pump, Scroll Vacuum Pump
Total Annual :
200000000-300000000
Employee Number :
1500~2200
Certification Level :
Verified Supplier
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