GRM602 Multi-Stage Roots Dry Vacuum Pump — 600 m³/h Medium-Capacity Solution
The GRM601 is a medium-capacity multi-stage roots dry vacuum pump delivering 600 m³/h pumping speed with an impressive ultimate pressure of ≤0.15 Pa. Its dual 1.9+1.9 kW permanent magnet synchronous motors provide reliable oil-free vacuum for semiconductor, photovoltaic, and lithium battery applications.
Key Features
- Multi-Stage Roots Design: High pumping speed with low power consumption
- Dual Motor Configuration: 1.9+1.9 kW for balanced, efficient operation
- Ultra-Low Ultimate Pressure: ≤0.15 Pa for demanding process requirements
- Ultra-Quiet: ≤63 dB(A) — ideal for cleanroom environments
- Oil-Free Mechanism: Zero oil contamination for sensitive processes
- Superior Particle Handling: Advanced rotor structure for dusty processes
- Compact Integration: 865 * 344 * 751 mm, 260 kg
- Dust & Vapor Insensitive: Reliable with process byproducts and moisture
- Advanced Sealing: Lip seal + labyrinth + nitrogen purge protection
- Remote Intelligence: I/O and RS485 (Modbus) for factory automation
Technical Specifications
| Model |
GRM602 |
| Pumping Speed |
600 m³/h |
| Ultimate Pressure (w/o purge) |
≤0.15 Pa |
| Motor Power |
1.9 + 1.9 kW |
| Voltage |
380V (3-Phase) |
| Inlet Connection |
ISO100 |
| Outlet Connection |
KF25 |
| Noise Level |
≤63 dB(A) |
| Weight |
260 kg |
| Dimensions (L*W*H) |
865 * 344 * 751 mm |
| Cooling Water Pressure |
0.1–0.6 MPa |
| Cooling Water Flow |
≥4 L/min |
| N₂ Purge Pressure |
0.2–0.6 MPa |
| N₂ Purge Flow |
12–50 L/min |
| Operating Temperature |
5–40°C; ≤90% RH |
Applications
- Semiconductor: PECVD, MOCVD, SACVD, RTP, HDP-CVD, ALD, Metal Etch, Silicon Etch
- Photovoltaic: Crystal growth, solar cell manufacturing
- Lithium Battery: Cell drying, electrolyte filling, degassing
- Flat Panel Display: LED and LCD manufacturing processes