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GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process
GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process
Specifications
Brand Name :
Baosi
Inlet :
ISO63
Dimensions :
741×344×466 mm
Cooling Water :
0.1-0.6 MPa, ≥3 L/min
Ultimate Pressure :
≤0.5 Pa
Noise :
≤63 dB(A)
Certification :
ISO9001,ISO14001,ISO45001
Payment Terms :
T/T
Outlet :
KF25
Model Number :
GRM201
Weight :
150 kg
N2 Purge :
0.2-0.6 MPa, 12-50 L/min
Place of Origin :
China
Motor Power :
1.9 kW
Delivery Time :
15-25 Working Days
Price :
Negotiable
Supply Ability :
60 Sets/Month
Packaging Details :
Export Standard Wooden Case Packaging
MOQ :
1 Set
Voltage :
380V/3-Phase
Pumping Speed :
200 m³/h
Description

GRM201 Multi-Stage Roots Dry Vacuum Pump — 200 m³/h Compact Oil-Free Solution

The GRM201 is a compact multi-stage roots dry vacuum pump delivering 200 m³/h pumping speed with an ultra-quiet operation at ≤63 dB(A). Its oil-free multi-stage roots design makes it ideal for clean and medium semiconductor processes, photovoltaic manufacturing, and lithium battery production lines that require contamination-free vacuum with minimal footprint.

Key Features

  • Multi-Stage Roots Design: Low power consumption with high pumping efficiency
  • Ultra-Quiet Operation: ≤63 dB(A) — the quietest in its class
  • Oil-Free Mechanism: Pump chamber contains absolutely no oil for clean process compatibility
  • Permanent Magnet Synchronous Motor: 1.9 kW with superior energy efficiency
  • Superior Dust Handling: Advanced rotor structure for enhanced particle exhaust
  • Compact Footprint: Only 741 * 344 * 466 mm, 150 kg — easy to integrate
  • Dust & Vapor Tolerant: Insensitive to process byproducts and moisture
  • Full Protection: Comprehensive safety features with adaptive capability
  • Smart Control: I/O and RS485 (Modbus protocol) for remote monitoring
  • Triple Sealing: Lip seal + labyrinth seal + nitrogen purge for guaranteed oil-free vacuum

Technical Specifications

ModelGRM201
Pumping Speed200 m³/h
Ultimate Pressure (w/o purge)≤0.5 Pa
Motor Power1.9 kW
Voltage380V (3-Phase)
Inlet ConnectionISO63
Outlet ConnectionKF25
Noise Level≤63 dB(A)
Weight150 kg
Dimensions (L*W*H)741 * 344 * 466 mm
Cooling Water Pressure0.1–0.6 MPa
Cooling Water Flow≥3 L/min
N₂ Purge Pressure0.2–0.6 MPa
N₂ Purge Flow12–50 L/min
Operating Temperature5–40°C; ≤90% RH

Applications

  • Semiconductor Clean/Medium Processes: ALD, PECVD, MOCVD, SACVD, RTP, HDP-CVD
  • Photovoltaic: Crystal growth furnaces, solar cell fabrication
  • Lithium Battery: Cell vacuum drying, electrolyte filling, degassing
  • R&D Laboratories: University and industrial research vacuum systems
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GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process

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Product Detail
Brand Name :
Baosi
Inlet :
ISO63
Dimensions :
741×344×466 mm
Cooling Water :
0.1-0.6 MPa, ≥3 L/min
Ultimate Pressure :
≤0.5 Pa
Noise :
≤63 dB(A)
Contact Supplier
GRM201 Multi-Stage Roots Dry Vacuum Pump 200 m³/h Oil-Free Compact Vacuum Pump for Semiconductor Clean Process

Ningbo Baosi Energy Equipment Co., Ltd.

Verified Supplier
9 Years
zhejiang, ningbo
Since 2005
Business Type :
Manufacturer, Importer, Exporter
Main Products :
Rotary Vane Vacuum Pump, DRV series Two-Stage Oil Rotary Vane Vacuum Pump, Scroll Vacuum Pump
Total Annual :
200000000-300000000
Employee Number :
1500~2200
Certification Level :
Verified Supplier
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