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Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid
Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid
Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid
Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid
Specifications
Brand Name :
HongJie
Certification :
ISO 14001,ISO 9001,CE,EPA
MOQ :
1set
Price :
US$66200~US$66500
Payment Terms :
L/C,D/P,T/T,Western Union
Supply Ability :
>300sets/month
Delivery Time :
1-7working days(depand on raw materials stocking)
Packaging Details :
export standard wooden case
Place of Origin :
Shenzhen,China
Flow Rate :
30T/H(Customizable)
Water Quality :
Resistivity ≥≥18.2 MΩ·cm (25°C)
TOC :
≤1 ppb
Particles :
≤5 particles/mL (≥0.05μm)
Core Process :
Double-pass Reverse Osmosis + EDI + Polishing Resin
Operation Mode :
Fully Automatic
Electricity Supply :
380V/220V
Product Features :
Stable Water Quality,Low Operation Cost,Reliable Performance
Description

I.Overview
Ultra-pure water is an indispensable core component in chemical mechanical polishing (CMP) polishing solutions, with its purity directly determining the performance of the polishing solution and chip yield. In semiconductor manufacturing, CMP polishing solutions must meet nanometer-level planarization requirements, and ultra-pure water plays a critical role and meets stringent technical requirements in this application.
In CMP polishing solutions, ultra-pure water is not only a solvent but also an active component that determines polishing uniformity, defect rates, and chip reliability. An ultra-pure water system compliant with the SEMI F63-1109 standard is the cornerstone for achieving a yield rate exceeding 95% in advanced processes (7nm and below).


II.Standard Process
Municipal Tap Water → Pretreatment (Multi - media Filtration) → Activated Carbon Adsorption (Residual Chlorine Removal) → Two - stage RO → EDI (Electrodeionization) Continuous Deionization → Mixed Bed Polishing → 185/254nm UV→ 0.05μm Ultrafiltration → Degassing Membrane → Nitrogen - Sealed Storage Tank → 316L Stainless Steel Piping → CMP Slurry Production Line


III.Parameters

Parameters Requirements
Resistivity ≥18.2 MΩ·cm (25°C)
TOC ≤1 ppb
Particles ≤5 particles/mL (≥0.05μm)
Dissolved Oxygen ≤10 ppb
Metal Ions Na⁺/K⁺ < 0.01 ppb
Fe/Cu/Al < 0.005 ppb
Anions Cl⁻/SO₄²⁻ < 0.02 ppb
Microorganisms < 0.1 CFU/mL


IV.The core functions of ultrapure water in CMP polishing fluid
Solvent carrier
Reaction medium
Contaminant control


V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )


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Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid

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Product Detail
Brand Name :
HongJie
Certification :
ISO 14001,ISO 9001,CE,EPA
MOQ :
1set
Price :
US$66200~US$66500
Payment Terms :
L/C,D/P,T/T,Western Union
Supply Ability :
>300sets/month
Contact Supplier
Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid
Custom Water Treatment 30tons/h Ultra Pure Water System For CMP Polishing Fluid

Shenzhen HongJie Water Technology Co., Ltd.

Verified Supplier
1 Years
shenzhen
Since 2013
Business Type :
Manufacturer
Main Products :
Pure Water Equipment, Ultrapure Water Equipment, Reverse Osmosis Systems
Total Annual :
25000000-30000000
Employee Number :
180~200
Certification Level :
Verified Supplier
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