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Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Specifications
Brand Name :
ZEIT
Model Number :
X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Material :
Quartz
Shipping Terms :
FEDEX, DHL, EMS, TNT, etc
Brand :
ZEIT
origin :
Chengdu, P.R.CHINA
Description

Quartz Photomask Substrate For FPD and Chip Use

Application Area

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

Photomask Substrate for FPD use

Model / Material Size Processing Capacity
5280 / Quartz 800mm × 520mm Grinding, Polishing, Chrome Plating, Gluing
3035 / Quartz 350mm × 300mm Grinding, Polishing, Chrome Plating, Gluing
6 inches / Quartz 152mm × 152mm Grinding, Polishing, Chrome Plating, Gluing
5 inches / Quartz 127mm × 127mm Grinding, Polishing, Chrome Plating, Gluing

Photomask Substrate for Chip use

Model / Material Size Processing Capacity
5009 / Quartz 5 inches × 5 inches × 0.09 inches Grinding, Polishing, Chrome Plating, Gluing
6012 / Quartz 6 inches × 6 inches × 0.12 inches Grinding, Polishing, Chrome Plating, Gluing
6025 / Quartz 6 inches × 6inches × 0.25 inches Grinding, Polishing, Chrome Plating, Gluing

Process Flow

→ Raw materials detection

→ Rough grinding

→ Rough polishing

→ Mask cleaning

→ Raw materials performance inspection

→ Plated by chrome

→ Mask performance testing

→ Photoresist coating

→ Packaging

→ Transporting

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use

Parts Of Our Patents
Grinding Polishing Quartz Photomask Substrate For FPD And Chip UseGrinding Polishing Quartz Photomask Substrate For FPD And Chip Use

Parts Of Our Awards and Qualifications of R&D

Grinding Polishing Quartz Photomask Substrate For FPD And Chip UseGrinding Polishing Quartz Photomask Substrate For FPD And Chip Use

Product tags

netherland diamond polishing tools

,

metallographic polisher

,

grinder polisher of metallographic
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Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use

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Product Detail
Brand Name :
ZEIT
Model Number :
X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Contact Supplier
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use
Grinding Polishing Quartz Photomask Substrate For FPD And Chip Use

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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