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152×152mm FPD Photomask Substrate For Micro Nano Fabrication
152×152mm FPD Photomask Substrate For Micro Nano Fabrication
152×152mm FPD Photomask Substrate For Micro Nano Fabrication
152×152mm FPD Photomask Substrate For Micro Nano Fabrication
Specifications
Brand Name :
ZEIT
Model Number :
6 inches
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Material :
Quartz
Shipping Terms :
FEDEX, DHL, EMS, TNT, etc
Model :
6 inches
Description

152mm × 152mm Quartz For FPD Use

Applications

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

for FPD use

Model / Material Size Processing Capacity
6 inches / Quartz 152mm × 152mm Grinding, Polishing, Chrome Plating, Gluing

Process Flow

→ Raw materials detection;

→ Rough grinding;

→ Rough polishing;

→ Mask cleaning;

→ Raw materials performance inspection;

→ Plated by chrome;

→ Mask performance testing;

→ Photoresist coating;

→ Packaging;

→ Transporting.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

152×152mm FPD Photomask Substrate For Micro Nano Fabrication

Parts Of Our Patents

152×152mm FPD Photomask Substrate For Micro Nano Fabrication152×152mm FPD Photomask Substrate For Micro Nano Fabrication

Parts Of Our Awards and Qualifications of R&D

152×152mm FPD Photomask Substrate For Micro Nano Fabrication152×152mm FPD Photomask Substrate For Micro Nano Fabrication

Product tags

laser 3d pen

,

optical plastic photochromic lens

,

photolithography process
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152×152mm FPD Photomask Substrate For Micro Nano Fabrication

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Product Detail
Brand Name :
ZEIT
Model Number :
6 inches
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Contact Supplier
152×152mm FPD Photomask Substrate For Micro Nano Fabrication
152×152mm FPD Photomask Substrate For Micro Nano Fabrication

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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