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6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process
6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process
6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process
6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process
Specifications
Brand Name :
ZEIT
Model Number :
6025
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Material :
Quartz
Shipping Terms :
FEDEX, DHL, EMS, TNT, etc
Used in :
photolithography process
Size :
6 inches × 6inches × 0.25 inches
Description

6 inches × 6inches × 0.25 inches Quartz Photomask Substrate For Chip Use

Applications

The fields of photolithography process, such as integrated circuit chip manufacturing, FPD (Flat Panel Display),

MEMS (Micro Electro Mechanical Systems), etc.

Working Principle

Mask is a graphic master mask commonly used in photolithography of micro-nano fabrication. The graphic structure

is formed on a transparent substrate by an opaque photomask, and then the graphic information is transferred to the

product substrate through an exposure process.

Features

Photomask Substrate for Chip use

Model / Material Size Processing Capacity
6025 / Quartz 6 inches × 6inches × 0.25 inches Grinding, Polishing, Chrome Plating, Gluing

Process Flow

→ Raw materials detection;

→ Rough grinding;

→ Rough polishing;

→ Mask cleaning;

→ Raw materials performance inspection;

→ Plated by chrome;

→ Mask performance testing;

→ Photoresist coating;

→ Packaging;

→ Transporting.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Parts Of Our Patents

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Parts Of Our Awards and Qualifications of R&D

6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

Product tags

photolithography process

,

3d lithography

,

electron beam lithography
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6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

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Product Detail
Brand Name :
ZEIT
Model Number :
6025
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1pcs
Price :
Case by case
Contact Supplier
6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process
6×6×0.25 Inches Quartz Photomask Substrate For Photolithography Process

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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