1,The HWF6630-10 type tank vapor deposition furnace is suitable for medium-temperature heat treatment of electronic products. It is mainly used for vapor phase reaction processes of related materials in nitrogen, acetylene, and hydrogen atmospheres, and can also be used for sintering processes of related materials under protective atmospheres. The furnace is fully equipped with a real-time computer monitoring system, making it particularly suitable for material process testing requirements in research institutes.

2. Model: HWF6630-10
2.1 Rated Temperature: 750°C;
2.2 Maximum Temperature: 1000°C;
2.3 Heating Zone Dimensions: Φ660×300mm (D×H);
2.4 Chamber Material: SUS310S;
2.5 Maximum Heating Power: 16kW;
2.6 Heating Method: Bottom + Surrounding;
2.7 Temperature Control Points: Bottom + Side, 2 points in total;
2.8 Thermocouple Type: K-type;
2.9 Heating Rate: ≤6°C/min;
2.10 Heating Element: FEC Ceramic Fiber Heater;
2.11 Door Opening Method: Top-opening design;
2.12 Temperature Stability: ±1°C;
2.13 Temperature Control Instrument: Imported temperature control module with PID auto-tuning function;
2.14 Program Steps: 20 steps;
2.15 Alarm Protection: Over-temperature and thermocouple breakage alarms with sound and light, and over-temperature alarm power-off protection;
2.16 Surface Temperature Rise: <35°C;
2.17 Equipment Weight: Approx. 750kg;
2.18 Overall Reference Dimensions: 1185×1745×1780mm (W×D×H), actual dimensions subject to final product;
2.19 Equipment Exterior Color: Light gray.

3. Delivery List

Hefei Chitherm Equipment Co., Ltd. is an advanced equipment supplier specializing in the research and development, design, manufacturing, sales, maintenance, and service of high-, medium-, and low-temperature industrial furnaces and laboratory furnaces. Its product range encompasses bell furnaces, box furnaces, hot air furnaces, vacuum furnaces, tube furnaces, mesh belt furnaces, bogie hearth furnaces, rotary furnaces, roller hearth furnaces, and pusher furnaces, which are extensively applied in fields such as advanced ceramics, electronic components, thick-film circuits, additive manufacturing, powder metallurgy, new energy, and photovoltaics. These furnaces are suitable for thermal treatment processes of materials including ITO targets, MLCC/HTCC/LTCC, ceramic filters, magnetic materials, CIM/MIM, and lithium battery cathodes and anodes, as well as various other new material processes such as pre-sintering, dewaxing, degreasing, sintering, drying, heat treatment, curing, and ceramization.