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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
Specifications
Brand Name :
HongJie
Certification :
ISO 14001,ISO 9001,CE,EPA
Place of Origin :
Shenzhen,China
MOQ :
>=1sets
Price :
US$44000~US$44500
Payment Terms :
L/C,D/P,T/T,Western Union
Supply Ability :
>300sets/month
Delivery Time :
1-7working days(depand on raw materials stocking)
Packaging Details :
export standard wooden case
Model Number :
HJ-UPWSe50T
Flow Rate :
50m³/H (Customizable)
Water Quality :
Resistivity≥18.18 MΩ·cm (25°C)
Core Process :
Reverse Osmosis + EDI + Polishing Resin
Key Components :
RO Membrane Modules, EDI Units
Electricity Supply :
380V/220V
After-Sales Service :
2-Year Warranty
Operation Mode :
Fully Automatic
Product Features :
Stable Water Quality,Low Operation Cost,Reliable Performance
TOC :
<0.5 ppb (Immersion fluid requirement <1 ppt)
Particulate Matter :
>0.05μm particles <1 per mL
Description

I.Overview
Ultra-pure water plays an indispensable and critically important role in the lithography process. Lithography is one of the most core steps in semiconductor manufacturing, and lithography-grade ultra-pure water serves as the foundational guarantee for the continued evolution of “Moore's Law,” with requirements for cleanliness and chemical purity reach to an almost stringent extent. Ultra-pure water (UPW), with its extremely low impurity content, is the ideal medium to meet these stringent requirements. Its ultimate purity is the fundamental guarantee for ensuring precise, defect-free lithography patterns and high yield rates.

II.Process
Raw water → Multi-stage filtration → Reverse osmosis (RO) → Electrodeionization (EDI) → UV-ozone synergistic oxidation → Membrane degassing → Dual-stage mixed-bed polishing → Terminal filtration → Nitrogen-sealed water tank

III.Parameters

Parameter Required Value
Resistivity ≥18.18 MΩ·cm (25°C)
Total Organic Carbon (TOC) <0.5 ppb (Immersion fluid requirement <1 ppt)
Particulate Matter >0.05μm particles <1 per mL
Dissolved Oxygen (DO) <5 ppb
Bacterial Content <0.01 CFU/mL
Silicon Dioxide (SiO₂) <1 ppb
Boron/Sodium Ions <10 ppt

IV.Application Scenarios
Wafer Cleaning
Post-Development Washing
Dilution and Preparation of Photoresist/Chemicals
Equipment and Component Cleaning

V.Here is a guideline for you to get a proper quotation
Tell us the raw water/source of water(tap water, well water, or sea water, etc)
Provide water analysis report(TDS , conductivity, or resistivity, etc)
Required production capacity( 5m³/H, 50m³/H,or 500m³/H, etc)
What's the pure water used for( industrial,Food and Beverage,or agriculture, etc )

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Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

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Product Detail
Brand Name :
HongJie
Certification :
ISO 14001,ISO 9001,CE,EPA
Place of Origin :
Shenzhen,China
MOQ :
>=1sets
Price :
US$44000~US$44500
Payment Terms :
L/C,D/P,T/T,Western Union
Contact Supplier
Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography
Custom Made 20T/H Industrial Ultra Pure Water Equipment For Lithography

Shenzhen HongJie Water Technology Co., Ltd.

Verified Supplier
1 Years
shenzhen
Since 2013
Business Type :
Manufacturer
Main Products :
Pure Water Equipment, Ultrapure Water Equipment, Reverse Osmosis Systems
Total Annual :
25000000-30000000
Employee Number :
180~200
Certification Level :
Verified Supplier
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