This industrial-grade EDI ultrapure water system is professionally engineered for semiconductor manufacturing, wafer etching, chip cleaning, electronic component production, and laboratory high-precision experiments. The equipment utilizes advanced two-stage RO reverse osmosis + EDI continuous electrodeionization technology with post-polishing purification to stably produce high-purity ultrapure water with maximum resistivity of 18.25MΩ·cm (@25℃), meeting the strictest water purity standards for semiconductor industrial production.

Unlike traditional mixed bed water treatment devices, this EDI ultrapure water equipment achieves chemical-free continuous deionization without acid-base regeneration, effectively preventing secondary water quality pollution. It thoroughly removes residual ions, colloids, organic matter, bacteria, heavy metals, and silica from raw water, ensuring zero impurity interference in semiconductor chip cleaning processes while significantly improving product yield and production stability.

The system employs multi-stage graded purification design to achieve ultra-high water purity progressively:

• Pretreatment System: Multi-media filter, activated carbon filter, and precision security filter effectively intercept sediment, rust, algae, large particle impurities, and residual chlorine, protecting subsequent RO membrane and EDI modules
• Two-stage RO Reverse Osmosis System: Double-layer high-precision RO membrane filtration with desalination rate up to 99.5%, removing most soluble salts and organic pollutants while providing stable pre-purified water for EDI system
• EDI Electrodeionization System: Core purification unit combining ion exchange resin and electric field technology for automatic continuous resin regeneration, deeply removing trace weak electrolytes like silicon and boron that are difficult to filter by RO
• Terminal Polishing & Sterilization System: UV TOC degradation device and 0.2μm ultrafiltration filter control TOC content below 1ppb, remove residual microorganisms, and ensure long-term stable semiconductor-grade water quality

• Ultra-high Water Purity & Stable Output: Maintains water resistivity at 15-18.25MΩ·cm at 25℃, TOC≤1ppb, zero bacterial residue, fully compliant with SEMI semiconductor industry standards
• Chemical-free & Eco-friendly Operation: No acid and alkali chemical regeneration, no chemical waste liquid discharge, reducing environmental pollution and chemical procurement costs
• Intelligent Automatic Control: PLC intelligent control system with full-color touch screen enables automatic water production, pressure protection, water shortage shutdown, and fault alarm with 24-hour continuous operation support
• Low Operation & Maintenance Cost: EDI module has long service life, no frequent resin consumable replacement, low water and power consumption, high water production recovery rate
• Compact & Customizable Design: Skid-mounted integrated structure with small footprint, easy installation and movement, customizable water flow (250L/H-5000L/H) based on production requirements
• Anti-corrosion & Durable Configuration: Food-grade and electronic-grade pipeline materials with anti-oxidation and anti-pollution properties prevent pipeline secondary pollution

• Semiconductor wafer cleaning, chip etching & lithography processes
• Electronic component, circuit board, and precision electronic manufacturing
• Microelectronics industry and semiconductor laboratory analysis
• High-purity water supply for new energy battery electronic workshops
• Precision instrument manufacturing and high-end scientific research experiments

We provide comprehensive services including design, manufacturing, installation, commissioning, and after-sales maintenance. All equipment supports customized configuration according to different semiconductor production processes, with 1-year whole machine warranty and long-term technical support. Our professional overseas engineering team offers remote guidance and after-sales service to ensure stable and efficient long-term equipment operation.