This industrial large-flow ultrapure water system is professionally engineered for semiconductor fabrication facilities, wafer production, electronic chip etching, cleaning, polishing, and integrated circuit manufacturing lines.

Chip production is extremely sensitive to micro impurities. Trace ions, silica, boron, organic carbon, tiny particles, and microorganisms in water can cause circuit short circuits, wafer scratches, pattern defects, leakage current, and low chip yield. This large-scale ultrapure water equipment employs a comprehensive industrial-grade two-stage RO + EDI + polishing mixed bed deep purification process, strictly complying with SEMI and ASTM electronic-grade water standards.

The system consistently delivers 18.25MΩ*cm high-purity ultrapure water with ultra-low TOC, ultra-low particles, and zero microbial residue. It is suitable for 24-hour continuous large-volume water supply for wafer cleaning, photolithography processes, etching cleaning, and chip surface rinsing, effectively improving finished chip qualification rates and stabilizing semiconductor production quality.

• High-load Industrial Pretreatment System: Large-flow multimedia filter, activated carbon filter, and automatic softening system remove massive sediment, residual chlorine, suspended solids, and reduce raw water hardness, preventing scaling and damage to core membrane elements under long-term high-load operation.
• Two-stage RO High-efficiency Desalination: Industrial high-flux and anti-fouling RO membranes remove more than 99.5% of soluble salts, colloids, and large organic pollutants, achieving primary high-precision purification.
• PH Adjustment & Intermediate Buffer System: Precise pH adjustment reduces dissolved carbon dioxide and residual silicon content, optimizing water quality for subsequent EDI deep deionization.
• Industrial EDI Continuous Deionization: Large-flow EDI module deeply removes trace boron, silicon, and residual ionic impurities without acid-base chemical regeneration, maintaining stable high resistivity water output.
• UV TOC Degradation & Sterilization: 185nm UV device decomposes total organic carbon, and 254nm UV eliminates bacteria, effectively controlling TOC within ppb level.
• Mixed Bed Polishing & Terminal Ultrafiltration: Post-stage polishing mixed bed + 0.05μm/0.22μm terminal precision filter removes ultrafine particles, ensuring full compliance with advanced semiconductor process water standards.

• Large Flow Continuous Industrial Water Supply: Customizable large water yield from 10m³/h to 100m³/h, supporting 24-hour uninterrupted high-load operation for semiconductor mass production lines.
• Semiconductor Grade Ultra-stable Water Quality: Consistently maintains 18.25MΩ*cm ultrapure water resistivity, TOC ≤1ppb, ultra-low silica and boron content, ultra-fine particle control, fully meeting advanced chip manufacturing process requirements.
• Strict Control of Trace Harmful Impurities: Effectively removes micro ions and particulate pollutants that cause chip defects, significantly reducing wafer scrapping rate and improving production yield.
• Industrial Anti-fouling & Durable Structure: Utilizes high anti-pollution RO membranes and enhanced industrial pipeline layout, adapting to long-term high-flow continuous operation with low fouling rate and extended service life.
• Intelligent Centralized Control System: PLC centralized intelligent control with real-time online monitoring of resistivity, TOC, pressure, and water flow. Automatic flushing, fault alarm, and data recording enable unmanned workshop management.
• Environmentally Friendly & Low Operating Cost: EDI chemical-free operation eliminates chemical waste liquid discharge. High water recovery rate conserves water and power consumption, ideal for long-term factory mass production.

• Semiconductor wafer fabrication & wafer surface cleaning
• IC integrated circuit, chip etching and photolithography process water
• Precision electronic component cleaning and circuit board rinsing
• Microelectronics, transistor and diode production process water
• Advanced semiconductor factory central ultrapure water station
• High-precision electronic instrument and semiconductor material cleaning

We provide comprehensive large-scale semiconductor water treatment engineering solutions, including raw water quality analysis, process customized design, factory assembly, on-site commissioning, and global technical support. Long-term operation training, remote fault diagnosis, and complete spare parts supply ensure stable, high-standard ultrapure water supply for electronic chip production lines.