Evaporation Vacuum Coating Machine for High Precision Optical Films
Advanced vacuum coating system designed for depositing high-precision optical multilayer films on glass, PC, and PMMA substrates with stable rotation and ion source technology.
Key Features
- Precision vacuum coating for high-precision optical multilayer films on glass, PC, and PMMA substrates
- Customizable components to meet specific customer requirements for superior film quality
- Central rotation mode (revolution) substrate umbrella frame minimizes vibration and particle generation
- Electron beam heating method without electrode plates ensures stable multi-layer film formation
- Proprietary ratio control method with multi-point online monitoring for precision optical films
- Removable substrate umbrella frame with well-operated lift mechanism
- Ion source with uniformly distributed high ion current density and dual electron guns
- Capable of processing more than 100 layers with multi-point and ring-shaped crucibles
- Fully automated evaporation process through automatic evaporation control system
- Choice of bell jar type or planetary type workpiece rack configurations
System Configuration
| Component |
Specifications |
| Fixture System |
Rotating umbrella frames on center, single or split configuration |
| Heating System |
Halogen lamp/armored heater, up to 350℃ |
| Exhaust System |
Low vacuum pump set + high vacuum pump set + cryogenic pump/Polycold |
| Vacuum Control |
Vacuum controller, Panning and Pirani vacuum gauges |
| Coating System |
Electron gun, oxygen-free copper crucible, impedance evaporation source, RF/Kaufman/Hall type ion source |
| Inflation System |
MFC or APC automatic pressure controller |
| Film Thickness Control |
Crystal controlled or light controlled |
| Control System |
PC + PLC integration |
Application Specifications
AR Film Coating
Substrate glass transmittance > 91.5%
- 420-680nm band: Average transmittance on one side > 95%, reflectance < 0.5% (average)
- Average transmittance on both sides > 98%, reflectance < 0.5% (average)
Performance Advantages
- Increased deposition rate for higher production output
- High-precision processing capabilities for semiconductor, optoelectronics, and photonics applications
- Durable construction with easy maintenance requirements