Core Introduction
Rf magnetron sputtering coating equipment is a coating device based on magnetron sputtering technology and equipped with RF power supply (commonly 13.56MHz).
It ionizes inert gases (such as argon) through a radio frequency electric field to form plasma. Under the constraint of a magnetic field, the plasma bombards the surface of the target material, causing the atoms or molecules of the target material to escape and deposit on the substrate surface, forming a uniform film.
Main features
Core advantages
Typical applications
In the field of electronic information:
Preparation of electrode films and insulating films for semiconductor chips, integrated circuits, and display panels.
Optical field:
Producing anti-reflection films, reflective films, filter films, etc., which are applied in lenses, optical instruments, photovoltaic modules, etc.
In the industrial and decorative fields:
Prepare wear-resistant, corrosion-resistant and decorative films for use in cutting tools, molds, hardware parts and architectural glass.
In the field of new energy:
It is used for lithium battery electrode films, fuel cell catalyst layers, solar cell coatings, etc.