Magnetron sputtering is a versatile Physical Vapor Deposition (PVD) technique widely used for depositing high-quality thin films on various substrates. It operates by ionizing a noble gas (e.g., argon) in a high-vacuum chamber (pressure < 10⁻³ Torr), creating plasma. Energetic ions from the plasma bombard a target material, ejecting atoms that then deposit onto the substrate as a uniform, adherent film. This method is particularly suited for metals, alloys, ceramics, and compound materials, offering precise control over film composition and thickness.
- Plasma Generation: A high-voltage electric field ionizes argon gas, producing Ar⁺ ions and electrons.
- Magnetic Confinement: A magnetic field (orthogonal to the electric field) traps electrons near the target surface, enhancing ionization efficiency and plasma density.
- Sputtering Process: Accelerated Ar⁺ ions strike the target, dislodging atoms that travel to the substrate and form a thin film. The magnetic field minimizes electron bombardment of the substrate, reducing heat damage .
- Uniformity & Adhesion: Produces films with exceptional thickness uniformity (±5%) and strong substrate adhesion due to high-energy ion bombardment .
- Material Versatility: Compatible with metals (e.g., Ti, Cu), ceramics (e.g., SiO₂, Al₂O₃), and semiconductors.
- Low-Temperature Deposition: Suitable for heat-sensitive materials like plastics and polymers.
- Process Control: Enables precise tuning of film properties (e.g., conductivity, hardness) via plasma parameters.
- Multi-Component Coatings: Supports co-sputtering of multiple targets for alloy or gradient-layer production .
- Electronics: IC packaging, display panels, and photovoltaic cells.
- Optics: Anti-reflective coatings, mirrors, and optical filters.
- Tooling: Wear-resistant coatings for cutting tools and molds.
- Automotive: Decorative and corrosion-resistant finishes on trim and components.
- Medical: Biocompatible coatings for implants and instruments .
- Surface Finishes: Metallic luster, matte textures, or textured patterns.
- Color Range: Silver, gold, black, blue, and custom hues via reactive sputtering (e.g., TiN for gold-like finishes).
- Planar Magnetron: Ideal for large-area deposition (e.g., glass or panels).
- Rotary Magnetron: Enhances target utilization and deposition rate for cylindrical or curved substrates.
- Unbalanced Magnetron: Generates plasma with high ion density for dense, adherent films.
- Plastics (ABS, PET, PC), glass, ceramics, metals, and composites.
- Metals: Ti, Cr, Ag, Al, Cu, Au.
- Ceramics: SiO₂, Al₂O₃, TiO₂, Si₃N₄.
- Alloys: NiCr, TiAl, and superalloys.
- Integrates with post-coating processes like UV curing or plasma treatment for enhanced functionality.
- Target materials (metallic/ceramic), argon gas, and sputtering power supplies.
- Optics: High-reflectivity mirrors and anti-glare coatings.
- Electronics: Transparent conductive oxides (ITO) for touchscreens.
- Aerospace: Thermal barrier coatings on turbine blades.
- Architectural Glass: Low-emissivity (low-E) coatings for energy efficiency.
Our systems offer modular designs with configurable magnetron arrays, vacuum pumping systems, and process control software to meet specific deposition requirements.
Magnetron Coating Equipment Model (Height ≤ 1.3m)
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watch industry, 3C industry, sanitary appliance industry, jewelry industry
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watch accessories, cell phone accessories, glasses frame, clothes, decorative lighting,sanitary ware, hardware suitcase, glass, ceramic and plastic, etc.
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Ti-Gold, Rose Gold, Champagne Gold, Japanese Gold, Bright Silver, Rainbow, Jewelry Blue, Rose Red, Black, etc.
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Vertical door structure, equip with air pumping system and water cooling system
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Sustaining Pump + Mechanical Pump + Roots Pump + Diffusion Pump
or Molecule Pump(specific model according to customers' requirements)
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1 set pirani, 1 set cold cathode, 1 set diaphragm gauge
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DC power, MF power, pulse power(bias power, arc power)
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1.0- 6.0×10-4Pa, Non-loading cooling
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Multi-axis planetary with frequency control(can be controlled and adjusted)
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Normal temperature~300℃ to 450℃ ~600℃ can be controlled and adjusted(PID temperature control)
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3 or 4 ways working gas flow control and display system matched with auto gas adding system
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Ar, N2, O2, C2H2,etc.
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Water cooling circulation, equip with industrial cooling tower or industrial water chiller(refrigerating machine) ,or cryogenic system.(customers provide)
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Manual, half-auto, auto, touch screen operation, PLC or computer controlled
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Alarming system will work when hydropenia, over-voltage, circuit break such abnormal situation happens and carry out related protect
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Voltage 380V,Frequency 50Hz(equip as customers' national electricity standard)
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Design and produce special machine according to customers' require, can add magnetron sputtering target,MF twins target,etc.
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