FEATURES:

1.A precision vacuum coating machine for forming high-precision optical multilayer films on glass /PC/PMMA substrates.

2. Combining various components that meet customer needs can form films of better quality.

3.The substrate umbrella frame adopts a central rotation mode (revolution), reducing the generation of vibration and particles, enabling the substrate to rotate stably.

4.Using the electron beam heating method without electrode plates on the crucible as the evaporation source can stably form multi-layer films.

5.By adopting our company's unique ratio control method and multi-point online monitoring, high-precision and stable optical multilayer films can be formed.

6.The substrate umbrella frame can be removed by using a well-operated lift.

7.By using an ion source with a uniformly distributed high ion current density, equipped with dual electron guns, multi-point and ring-shaped crucibles can be used for more than 100 layers of plating.

8.The fully automatic evaporation process is realized through an automatic evaporation control system. The workpiece rack can be selected as either bell jar type or planetary type.

Main configuration

Fixture system:Rotating umbrella frames on the center of the fixture system, either single or split

Heating system: Halogen lamp/armored heater, up to 350℃

Exhaust system: low vacuum pump set + high vacuum pump set + cryogenic pump/Polycold

Vacuum control system: vacuum controller, Panning and Pirani vacuum gauges

Coating system electron gun, oxygen-free copper crucible, impedance evaporation source, radio frequency/Kaufman type/Hall type ion source

Inflation system MFC or APC automatic pressure controller

The film thickness controller :crystal controlled or light controlled

Control system: PC+PLC

APPLICATIONS:

AR film (substrate glass transmittance > 91.5%) :
■ In the 420-680nm band, the average transmittance on one side is > 95%, and the reflectance is less than 0.5 (average) %;
■ The average transmittance on both sides is > 98%, and the reflectance is less than 0.5 (average) %;

Advantages

1.Increase the deposition rate to achieve higher output
2.Achieve high-precision processes in the fields of semiconductors, optoelectronics and photonics
3. Durable and easy to maintain