Our single station spin coater is engineered for uniform thin film deposition of photoresist, polyimide, sol-gel, and nanoparticles. It features exceptional speed stability (< ±1% fluctuation), low vibration operation, and a chemical-resistant bowl. The compact design makes it ideal for R&D laboratories, pilot lines, and small-batch production environments.
Customizable options include: chuck size, bowl material (PTFE/PP/stainless steel), motor type (brushless DC/servo), and exhaust port position.
| Parameter | Standard Range | Customizable Option |
|---|---|---|
| Substrate size | 10 mm - 150 mm dia. | Up to 200 mm square |
| Speed range | 100 - 12,000 rpm | 50 - 15,000 rpm |
| Acceleration | 100 - 10,000 rpm/s | Customizable ramp profiles |
| Speed stability | ±0.5% | ±0.1% (servo motor) |
| Program steps | 10 programs, 20 steps each | Unlimited steps customizable |
| Chuck type | Vacuum chuck (aluminum) | PTFE / ceramic / custom pattern |
| Bowl material | Polypropylene (PP) | PTFE / stainless steel 316L |
| Exhaust port | Ø50 mm rear | Left / right / dual ports |
| Motor type | Brushless DC | Servo motor customizable |
| Display | 4.3" LCD | 7" HMI touch screen |
| Power | 220V/50Hz or 110V/60Hz | Available for any voltage |