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Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃
Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃
Specifications
Brand Name :
Jietai
Model Number :
JTM-100504AD
Certification :
CE, FCC, ROHS, etc.
Place of Origin :
Dongguan, Guangdong
MOQ :
1
Price :
￥800000
Payment Terms :
T/T
Supply Ability :
One unit. It will take 30 to 60 days.
Delivery Time :
30-60work days
Packaging Details :
Packaging: Wooden case, wooden frame, stretch film. Dimensions: 12M*2M*2.8M
Cleaning Frequency :
40KHZ/80KHZ
Type :
Ultrasonic alkaline washing+Ultrasonic acid washing+Pure water rinsing
Name :
Semiconductor Cleaning Machine
Cleaning temperature :
60℃
Overall Dimensions :
12M*2M*2.8M
Model :
JTM-100504AD
Number of Tanks :
10
Power :
120KW
Description
Product Introduction: Semiconductor Silicon Wafer Cleaning System​
Tailored for high-precision semiconductor manufacturing, this integrated cleaning system combines multi-stage ultrasonic processes to deliver sub-ppb level surface purity, a critical prerequisite for silicon wafer fabrication in advanced node (≤7nm) microelectronics production.​
Stage-by-Stage Cleaning Mechanism:​
  • Ultrasonic Alkaline Cleaning: Operates at 40KHz-80KHz to generate controlled cavitation in alkaline media, efficiently stripping organic contaminants (e.g., photoresist, hydrocarbons) and particulate matter (≥1μm) from wafer surfaces and patterned structures. The frequency-tunable ultrasonic energy ensures uniform cleaning across 4"-12" wafers, including edge bevels and backside surfaces.​
  • Ultrasonic Acid Cleaning: Utilizes the same frequency range in acidic solutions to target inorganic impurities—specifically metal ion contaminants (Fe, Cu, Zn) and native oxide layers (SiO₂). This stage employs cavitation-induced micro-jets to dislodge sub-100nm particles embedded in trenches or vias, validated by laser particle counters (≤5 particles/wafer for ≥0.1μm).​
  • Pure Water Rinse Cycle: Final rinse with UPW (ultra-pure water, TOC ≤3ppb) eliminates residual chemistries, achieving surface resistivity ≥18.2MΩ·cm to meet SEMI F020 standards for pre-deposition processing.​
Technical Specifications:​
  • Ultrasonic Frequency Band: 40KHz-80KHz (multi-frequency selectable via PLC, optimizing cavitation intensity for contamination type)​
  • Process Temperature: 60℃ (PID-controlled, ±0.5℃ tolerance) to accelerate chemical reactivity without inducing wafer stress​
  • Material Compatibility: Wetted components in PFA and high-purity alumina to resist HF/H₂SO₄ corrosion, preventing particle shedding​
Core Performance Metrics:​
  • Particle Removal Efficiency (PRE) ≥99.9% for ≥0.1μm contaminants​
  • Chemical residue elimination ≤0.1ng/cm² (ICP-MS verified)​
  • Compatible with automated cassette handling (FOUP/SMIF) for 24/7 fab integration​
Application: Essential for pre-litho, post-CMP, and pre-implant cleaning in logic, memory, and sensor wafer production lines.​
Keywords: Semiconductor wafer cleaner, ultrasonic alkaline/acid cleaning, UPW rinsing, 40-80KHz, 60℃ process, silicon wafer decontamination​
This system ensures consistent cleaning performance to maximize yield in high-volume semiconductor manufacturing environments.

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

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Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

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Product Detail
Brand Name :
Jietai
Model Number :
JTM-100504AD
Certification :
CE, FCC, ROHS, etc.
Place of Origin :
Dongguan, Guangdong
MOQ :
1
Price :
￥800000
Contact Supplier
video
Semiconductor Silicon Wafer Cleaner - 40KHz-80KHz Ultrasonic Alkaline/Acid Cleaning + Pure Water Rinsing, 60℃

guangdong Jietai Ultrasonic cleaning Equipment Co., Ltd.

Verified Supplier
1 Years
guangdong, dongguan
Since 2005
Business Type :
Manufacturer
Main Products :
Ultrasonic Cleaning Equipment, Electronics Ultrasonic Cleaner, Instrument Ultrasonic Cleaner
Total Annual :
4,397,596.73-6,397,596.73
Employee Number :
460~500
Certification Level :
Verified Supplier
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