2200℃ 1-to-1 Vacuum Resistance Furnace for SiC & Graphite Heat Treatment

Description:

• This 2200℃ batch resistance furnace adopts a 1-to-1 cabinet-furnace configuration (380V 3-phase power, thyristor control), integrating resistance heating with a sealed vacuum chamber (20Pa ultimate) to maintain high-temp uniformity.
• Built with industrial durability, its robust structure + intelligent temp control system (precise heating/hold/cool regulation) ensures uniform workpiece heating for strict sintering needs.
• Equipped with a user-friendly interface and safety safeguards (over-temp alarm, vacuum leak detection), it suits both lab R&D and industrial manufacturing scenarios.

Application:

• Ceramic & Carbide Materials: Sintering of SiC, boron carbide plates, and polysilicon.
• Carbon & Graphite Materials: Debinding/dewax of PI film, heat treatment of radiation-proof material and graphite.
• Alloys & Special Materials: Processing of tungsten carbide, rhenium material, and magnesium fluoride.

Specification:

Furnace Configuration:

• High-Temperature Capability: Reaches up to 2200℃.
• Vacuum & Resistance Heating: Vacuum environment prevents material oxidation.
• Precise Control: Equipped with FP93 Japanese Shimaden High-Precise Temperature Control System, ensuring stable sintering processes and consistent product quality.
• Versatility: Compatible with a wide range of materials (carbon,ceramics, alloys, c/c,special powders), meeting diverse production needs.
• Safety & Reliability: Equipped with short circuit, over pressure, over-temperature, over current, water shortage, and other protection mechanisms for safe operation.