2200°C Vacuum Resistance Carbonizing Furnace with Uniform Heating for PI Film

Description:

• Designed for batch industrial production, this1-to-1 vacuum resistance furnace achieves 2200°C via high-efficiency resistance heating and a sealed vacuum chamber (ultimate vacuum: 20Pa). Drivenby 380V three-phase power and regulated by thyristors, it guarantees stable temperature output evenin long-term production cycles.
• Featuring a heavy-duty industrial structure resistant to wear from continuous operation, its intelligent temperature control system precisely adjusts heating rates and holding durations to ensure consistentprocessing of large batches. This design minimizes product deviation and enhances overall yield forhigh-demand materials.
• Fitted with automatic safety functions (vacuum leak detection, over-temperature cut-off, power failureprotection) and a streamlined operation interface, it reduces manual work and operational hazards,rendering it suitable for mass production of hard alloys, SiC components, and carbon materials

Application:

• Graphite Electrode Production: Mass heat treatment for metallurgical and industrial applications.
• PI Film Debinding: High-throughput processing for carbon fiber precursor manufacturing lines.
• Radiation-Proof Material Sintering: Large-batch production of carbon-based shielding components.

Specification:

Furnace Configuration:

• High-Temperature Capability: Reaches up to 2200℃.
• Vacuum & Resistance Heating: Vacuum environment prevents material oxidation.
• Precise Control: Equipped with FP93 Japanese Shimaden High-Precise Temperature Control System, ensuring stable sintering processes and consistent product quality.
• Versatility: Compatible with a wide range of materials (carbon,ceramics, alloys, c/c,special powders), meeting diverse production needs.
• Safety & Reliability: Equipped with short circuit, over pressure, over-temperature, over current, water shortage, and other protection mechanisms for safe operation.