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TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO
TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO
Specifications
Brand Name :
ZEIT
Model Number :
ALD1200-500
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
350±200KG, Customizable
Size :
1900 mm*1200mm*2000mm, Customizable
Customizable :
Available
Guarantee period :
1 year or case by case
Shipping Terms :
By Sea / Air / Multimodal Transport
Coating film system :
AL2O3, TiO2, ZnO, etc
Coating size :
200×200mm² / 400×400mm² / 1200×1200 mm², etc
Description

ALD Atomic Layer Deposition

Applications

Applications Specific Purpose ALD Material Type
MEMS devices Etching barrier layer Al2O3
Protective layer Al2O3
Anti-bonding layer TiO2
Hydrophobic layer Al2O3
Bonding layer Al2O3
Wear-resistant layer Al2O3, TiO2
Anti-short circuit layer Al2O3
Charge dissipation layer ZnO: Al
Electroluminescent display Luminous layer ZnS: Mn / Er
Passivation layer Al2O3
Storage materials Ferroelectric materials HfO2
Paramagnetic materials Gd2O3, Er2O3, Dy₂O₃, Ho2O3
Non-magnetic coupling Ru, Ir
Electrodes Precious metals
Inductive coupling (ICP) High-k gate dielectric layer HfO2, TiO2, Ta2O5, ZrO₂
Crystalline silicon solar battery Surface passivation Al2O3
Perovskite thin-film battery Buffer Layer ZnxMnyO
Transparent conducting layer ZnO: Al
3D packaging Through-Silicon-Vias (TSVs) Cu, Ru, TiN
Luminous application OLED passivation layer Al2O3
Sensors Passivation layer, filler materials Al2O3, SiO2
Medical treatment Biocompatible materials Al2O3, TiO2
Corrosion protection layer Surface corrosion protection layer Al2O3
Fuel battery Catalyst Pt, Pd, Rh
Lithium battery Electrode material protection layer Al2O3
Hard disk read/write head Passivation layer Al2O3
Decorative coating Colored film, metallized film Al2O3, TiO2
Anti-discoloration coating Precious metal anti-oxidation coating Al2O3, TiO2
Optical films High-low refractive index

MgF2, SiO2, ZnS, TiO2, Ta2O5,

ZrO2, HfO2

Working Principle

Atomic layer deposition (ALD) is a method of depositing the substances on the surface of substrate in the

form of single atomic film layer by layer. Atomic layer deposition is similar to common chemical deposition,

but in the process of atomic layer deposition, the chemical reaction of a new layer of atomic film is directly

associated with the previous layer, so that only one layer of atoms is deposited in each reaction by this method.

Features

Model ALD1200-500
Coating film system AL2O3, TiO2, ZnO, etc
Coating temperature range Normal temperature to 500℃ (Customizable)
Coating vacuum chamber size Inner diameter: 1200mm, Height: 500mm (Customizable)
Vacuum chamber structure According to customer’s requirements
Background vacuum <5×10-7mbar
Coating thickness ≥0.15nm
Thickness control precision ±0.1nm
Coating size 200×200mm² / 400×400mm² / 1200×1200 mm², etc
Film thickness uniformity ≤±0.5%
Precursor and Carrier Gas

Trimethylaluminum, titanium tetrachloride, diethyl zinc, pure water,

nitrogen, etc. ( C₃H₉Al, TiCl4, C₄HZn,H2O,N₂, etc.)
Note: Customized production available.

Coating Samples

TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISOTiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and

cooling is completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages

We are manufacturer.

Mature process.

Reply within 24 working hours.

Our ISO Certification

TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

Parts Of Our Patents

TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISOTiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

Parts Of Our Awards and Qualifications of R&D

TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISOTiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

Product tags

titanium coating pvd process

,

xpel paint protection film

,

suntek paint protection film
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Product Detail
Brand Name :
ZEIT
Model Number :
ALD1200-500
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
TiO2 Al2O3 Optical Coating ALD Deposition Equipment ISO

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Main Products :
Optical Coating Equipment, Optical Testing Equipment, Photomask Substrate
Total Annual :
＄10,000,000-＄15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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