Specifications
Brand Name :
ZEIT
Model Number :
MSC-O-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Payment Terms :
T/T
Supply Ability :
Case by case
Delivery Time :
Case by case
Packaging Details :
Wooden case
Weight :
Customizable
Size :
Customizable
Customizable :
Available
Guarantee period :
1 year or case by case
Shipping Terms :
By Sea / Air / Multimodal Transport
Description

Magnetron Sputtering Deposition in Optics Industry


Applications

Applications Specific Purpose Material Type
Optics

Optical films such as antireflection film,
high-low refractive index

SiO2, TiO2, Ta2O5, ZrO2, HfO2
Low-emission glass

Multiple layers of metal (silver, copper, tin, etc.)
or other compounds

Transparent conducting glass ZnO:Al, etc


Working Principle
The features of magnetron sputtering are high film-forming rate, low substrate temperature, good film adhesion
and realizable large area coating. This technology can be divided into DC magnetron sputtering and RF magnetron
sputtering.

Features

Model MSC-O-X—X
Coating type Various dielectric films such as metal film, metal oxide and AIN
Coating temperature range Normal temperature to 500℃
Coating vacuum chamber size 700mm*750mm*700mm (Customizable)
Background vacuum < 5×10-7mbar
Coating thickness ≥ 10nm
Thickness control precision ≤ ±3%
Maximum coating size ≥ 100mm (Customizable)
Film thickness uniformity ≤ ±0.5%
Substrate carrier With planetary rotation mechanism
Target material 4×4 inches(compatible with 4 inches and below)
Power supply The power supplies such as DC, pulse, RF, IF and bias are optional
Process gas Ar, N2, O2
Note: Customized production available.


Coating Sample

HfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

Process Steps
→ Place the substrate for coating into the vacuum chamber;
→ Vacuumize the vacuum chamber at high and low temperature, and rotate the substrate synchronously;
→ Start coating: the substrate is contacted with precursor in sequence and without simultaneous reaction;
→ Purge it with high-purity nitrogen gas after each reaction;
→ Stop rotating the substrate after the film thickness is up to standard and the operation of purging and cooling is

completed, then take out the substrate after the vacuum breaking conditions are met.

Our Advantages
We are manufacturer.
Mature process.
Reply within 24 working hours.

Our ISO Certification
HfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

Parts Of Our Patents
HfO2 Deposition Magnetron Sputtering Coating Machine For Optics IndustryHfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

Parts Of Our Awards and Qualifications of R&D

HfO2 Deposition Magnetron Sputtering Coating Machine For Optics IndustryHfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

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HfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

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Brand Name :
ZEIT
Model Number :
MSC-O-X—X
Certification :
Case by case
Place of Origin :
Chengdu, P.R.CHINA
MOQ :
1set
Price :
Case by case
Contact Supplier
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HfO2 Deposition Magnetron Sputtering Coating Machine For Optics Industry

ZEIT Group

Active Member
4 Years
sichuan, chengdu
Since 2018
Business Type :
Manufacturer, Exporter, Seller
Total Annual :
$10,000,000-$15,000,000
Employee Number :
120~200
Certification Level :
Active Member
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