|
Major capability parameter
|
|||
|
Growth method
|
Czochralski method
|
||
|
Crystal structure
|
M3
|
||
|
Unit cell constant
|
a=5.65754 Å
|
||
|
Density
|
5.323g/cm3
|
||
|
Melt point
|
937.4℃
|
||
|
Doped material
|
No doped
|
Sb-doped
|
In / Ga –doped
|
|
Type
|
/
|
N
|
P
|
|
Resistivity
|
>35Ωcm
|
0.05Ωcm
|
0.05~0.1Ωcm
|
|
EPD
|
<4×103∕cm2
|
<4×103∕cm2
|
<4×103∕cm2
|
|
Size
|
10x3,10x5,10x10,15x15,,20x15,20x20,
|
||
|
dia2” x 0.33mm dia2” x 0.43mm 15 x 15 mm
|
|||
|
Thickness
|
0.5mm,1.0mm
|
||
|
Polishing
|
Single or double
|
||
|
Crystal orientation
|
<100>,<110>,<111>,±0.5º
|
||
|
Ra:
|
≤5Å(5µm×5µm)
|
||
|
Pack
|
100 clean bag,1000 exactly clean bag
|
||