This OWP-BL43-426C Electric Coolant Pump is specifically tailored for the liquid cooling systems of etching machines, a critical component in maintaining stable etching operations. Etching machines generate substantial heat during plasma etching—driven by high-frequency electric fields and intense ion bombardment—targeting key parts like the etching head and reaction chamber. Uncontrolled heat leads to unstable etching rates, potential equipment damage, and compromised semiconductor product quality.

The pump addresses these challenges by efficiently circulating cooling media (such as 50-60% glycol-water or electronic fluorinated solution) through the etching machine’s cooling circuit. It ensures consistent heat dissipation from the electrostatic chuck (ESC) and reaction chamber: by maintaining the ESC at a precise temperature, it guarantees uniform etching rates across the wafer; by stabilizing the chamber wall temperature, it controls fluctuations in etching selectivity. Its high flow rate (up to 5000L/H) and max lift head (20M) enable rapid heat transfer, even in complex cooling loops, while the PWM speed regulation allows real-time adjustment to match the etching machine’s dynamic heat output—ensuring optimal cooling performance at all operational stages.

• Reliable Protection Mechanisms: Equipped with multiple safeguards (reverse polarity, dry running, over voltage/current, overload, over temperature protection), it prevents pump damage and ensures continuous operation, critical for uninterrupted etching processes.
• Efficient & Durable Design: Features a high-efficiency brushless DC motor that reduces power consumption while delivering long service life (over 20000 hours). The magnetic force transmission (shield pump structure) enhances leak-proof performance, protecting cooling media purity.
• Wide Adaptability: With an IP68 rating and operational temperature range of -40℃ to +85℃, it works seamlessly in harsh industrial environments where etching machines are typically deployed. The flange quick-connect design simplifies installation and maintenance, minimizing downtime.
• Precise Control: Constant flow controlling and PWM speed regulation enable accurate adjustment of cooling capacity, aligning with the strict temperature requirements of etching processes to improve semiconductor product yield.

PWM Speed Mode & Fault Feedback

Performance Curve

Dimensions Diagrams