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OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
Specifications
Brand Name :
CNOEC, OPTO-EDU
Model Number :
A63.7010
Certification :
CE,
Place of Origin :
China
MOQ :
1 pc
Price :
FOB $1~1000, Depend on Order Quantity
Payment Terms :
T/T,West Union,Paypal
Supply Ability :
5000 pcs/ Month
Delivery Time :
180 Days
Packaging Details :
Carton Packing, For Export Transportation
Standard Equipment :
Laser Interferometer Stage
Stage Travel :
≤105 mm
Image Resolution :
≤1nm@15kV; ≤1.5nm@1kV
Beam Current Densit :
>5300 A/cm2
Minimum Beam Spot Size :
≤2 nm
Electron Beam Shutter :
Rise Time < 100 ns
Description
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
Stage Specifications
Standard Equipment Laser Interferometer Stage
Stage Travel ≤105 mm
Electron Gun and Imaging Specitications
Schottky Field Emission Gun Acceleration Voltage 2OV~ 30kVSide Secondary ElectronDetector and
In-Lens Electron Detector
Image Resolution ≤1nm@15kV; ≤1.5nm@1kV
Beam Current Densit >5300 A/cm2
Minimum Beam Spot Size ≤2 nm
Lithography Specitications
Electron Beam Shutter Rise Time < 100 ns
Writing Field ≤500x500 um
Minimum Single Exposure Line Width 10±2nm
Scan Speed 25 MHz/ 50 MHz
Graphics Generator Parameters
Control Core High-performance FPGA
Maximum Scan speed 50 MHz
D/A Resolution 20-bit
Supported Writing Field Sizes 10 um~500 um
Beam Shutter Suppor 5VTTL
Minimum Dwell Time Increment 10ns
Supported File Formats GDSIl, DXF, BMP, etc.
Faraday Cup Beam Current Measurement Included
Proximity Effect Correction Optional
Laser Interferometer Stage Optional
Scan Modes Sequential (Z-type), Serpentine (S-type), Spiral, and other vector scan modes
Exposure Modes Supports field calibration, field stitching, overlay, and multi-layer automatic exposure
External Channel Support supports electron beam scanning, stage movement, beam shutter controL, andsecondary electron detection
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

Laser Interferometer Stage

Laser Interferometer Stage: An advanced laser interferometer stage that meets the requirements for large-stroke, high-precision stitching and overlay

Field Emission Gun

A high-resolution field emission gun is an important guarantee for lithography quality
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

Graphics Generator

Achieves ultra-high resolution pattern drawing while ensuring ultra-high-speed scanning

A63.7010 VS Raith 150 Two
Device Model OPTO-EDU A63.7010 (China) Raith 150 Two (Germany)
Acceleration Voltage (kV) 30 30
Min. Beam SpotDiameter (nm) 2 1.6
Stage Size (inch) 4 4
Minimum Linewidth (nm) 10 8
Stitching Accuracy (nm) 50(35nm) 35
Overlay Accuracy (nm) 50(35nm) 35
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

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OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

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Product Detail
Brand Name :
CNOEC, OPTO-EDU
Model Number :
A63.7010
Certification :
CE,
Place of Origin :
China
MOQ :
1 pc
Price :
FOB $1~1000, Depend on Order Quantity
Contact Supplier
OPTO-EDU A63.7010 EBL Electron Beam Lithography Machine

Opto-Edu (Beijing) Co., Ltd.

Verified Supplier
13 Years
beijing, beijing
Since 1995
Business Type :
Manufacturer, Distributor/Wholesaler, Exporter, Trading Company, Seller
Main Products :
Compound Optical Microscope, Stereo Optical Microscope, Digital Optical Microscope
Total Annual :
6000000-8000000
Employee Number :
10~20
Certification Level :
Verified Supplier
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