▶ Ultra-fast Imaging

● Achieved dual-channel synchronous imaging of secondary electrons and backscattered electrons through independently developed hardware and software design: video-level high-resolution imaging;

● High-definition video-level frame rate allows real-time observation of sample dynamic changes;

▶ High Imaging Quality

● Unique immersion electromagnetic compound lens system effectively reduces optical aberrations of the objective lens at low landing energies, achieving extremely high resolution;

● Electrostatic scanning deflection system combined with the objective lens field greatly reduces image edge distortion compared to traditional electron microscope magnetic deflection systems, allowing for perfect images with both high resolution and large field of view;

● In-Lens SE and BSE semiconductor direct electron detectors enable dual-channel simultaneous high-speed imaging, with high sensitivity and high signal electron collection efficiency, achieving high image contrast and signal-to-noise ratio even under nA-level high beam current conditions;

● Equipped with an active compensation system (laser interference vibration compensation, electromagnetic interference active compensation) to eliminate environmental interference, ensuring high-resolution and high-quality imaging;

▶ Cross-Scale Large-Scale Imaging

● Ultra-high-speed scanning imaging capability, combined with a fully automatic focusing tracking system and A.I. image processing algorithms, enables high-resolution fully automatic uninterrupted matrix scanning of ultra-large area samples, automatically stitching to obtain large-size nanometer-level resolution panoramic imaging, providing cross-scale information fusion capability, achieving cross-scale material characterization from nanometers to millimeters;