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High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
Specifications
Brand Name :
JINXING
Model Number :
High Purity Tungsten Sputtering Target for Thin Film Industry
Certification :
ISO 9001
Place of Origin :
CHINA
MOQ :
10 kg
Price :
Negotiable
Payment Terms :
L/C, T/T, D/P, Western Union
Supply Ability :
200 kg per month
Delivery Time :
15-20 days
Packaging Details :
plywood cases
Product Name :
High Purity Tungsten Sputtering Target for Thin Film Industry
Grade :
W1
Purity :
>=99.95%
Tensile Strength :
>320 MPa
Elongation :
<22%
Standard :
ASTM B387-2010
Applications :
Precision Moulding
Description

High Purity Tungsten Sputtering Target for Thin Film Industry

Tungsten Sputtering Targets has the highest melting point (3422℃, 6192 ℉) of all metals in pure form. It has the lowest vapor pressure (at temperatures above 1650℃, 3000 ℉) and the highest tensile strength.

Tungsten Sputtering Targets Information

Tungsten Sputtering Targets
Purity: 99.95%;

Circular: Diameter ≤ 14 inch, Thickness ≥ 0.040''
Block: Length ≤ 32 inch, Width ≤ 12 inch, Thickness ≥ 1mm.

Applications

• Electronics
• Semiconductor
• Flat panel displays

Features

• Competitive pricing
• High purity
• Grain refined, Engineered microstructure
• Semiconductor grade

Tungsten Sputtering Targets Picture:
High Purity Alloy Tungsten Sputtering Target For Thin Film IndustryHigh Purity Alloy Tungsten Sputtering Target For Thin Film Industry

Tungsten has the highest melting point (3422℃, 6192 ℉) of all metals in pure form. It has the lowest vapor pressure (at temperatures above 1650℃, 3000 ℉) and the highest tensile strength. Although Carbon remains stable at higher temperatures than tungsten, Carbon sublimes at atmospheric pressure instead of melting, so it has no melting point. Tungsten has the lowest coefficient of thermal expansion of any pure metal. The low thermal expansion and high melting point, and tensile strength of tungsten originate from strong covalent bonds formed between tungsten atoms by the 5d electrons. Alloying small quantities of tungsten with steel dramatically increases its toughness.

Product tags

tungsten sputtering target

,

aluminium alloy profiling

,

alumimium extrusion profiles
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High Purity Alloy Tungsten Sputtering Target For Thin Film Industry

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Product Detail
Brand Name :
JINXING
Model Number :
High Purity Tungsten Sputtering Target for Thin Film Industry
Certification :
ISO 9001
Place of Origin :
CHINA
MOQ :
10 kg
Price :
Negotiable
Contact Supplier
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High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry
High Purity Alloy Tungsten Sputtering Target For Thin Film Industry

JINXING MATECH CO LTD

Site Member
6 Years
Since 2007
Business Type :
Manufacturer, Distributor/Wholesaler, Importer, Exporter, Seller, Other
Main Products :
Zirconium Bar, Tungsten Copper Alloy, Tungsten Heavy Alloy
Total Annual :
5,000,000-10,000,000
Employee Number :
10~25
Certification Level :
Site Member
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