Zirconium Cylindrical Sputtering target for PVD Vacuum Coating
Planar Sputtering target for PVD vacuum coating machine is widely used in Multi-arc ion or Magnetron Sputtering PVD vacuum coating industry for decorative PVD coating or functional coating, we can provide you different purity according to your different requirements.
Specification
| Composition | Zr |
| Purity | R60702, 3N (99.9%), 3N5 (99.95%), 4N (99.99%) |
| Density | 6.50 g/cm3 |
| Grain Sizes | < 50 micron or on request |
| Fabrication Processes | Vacuum Melting, Forging, Extruding, Machining |
| Shape | Straight, Dog bone |
| End Types | SCI, SRF, DSF, RFF, WFF, VA, GPI Ends Fixation, Spiral Groove, Custom Made |
| Surface | Ra 1.6 micron |
Zirconium Cylindrical Sputtering target Picture:

