RF Magnetron Sputtering Coating Equipment
Professional PVD vacuum coating machine designed for coating glasses, metals, and various substrates with precision thin films.
Core Technology Introduction
RF magnetron sputtering coating equipment utilizes magnetron sputtering technology with RF power supply (typically 13.56MHz). The system ionizes inert gases such as argon through radio frequency electric fields to generate plasma. Under magnetic field constraints, the plasma bombards target material surfaces, causing atoms or molecules to escape and deposit uniformly on substrate surfaces, forming high-quality thin films.