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Pulsed Laser Deposition System
Pulsed Laser Deposition System
Specifications
Place of Origin :
China
Description

Main parameter index:
1.: the ultimate vacuum coating chamber is ≤6.6X10-5Pa; the pumping time: 30 minutes is better than 8X10-4Pa
2. target: 4 feet rotation target (with shield), revolution, rotation and scanning, target substrate distance adjustable (30-90mm)
3. substrate rotation: revolution, rotation of two samples of toga shield
4. substrate heating temperature: the use of armored heating plate,0-800℃ continuous adjustable; using temperature control instrument for automatic temperature measurement and control of PID, temperature control accuracy ±1℃
5. 2 way MFC mass flowmeter (range: 0-100sccm) controls the flow of gas
6. control system: touch screen +PLC control

Product tags

laser process

,

laser production

,

laser additive manufacturing process
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Pulsed Laser Deposition System

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Product Detail
Place of Origin :
China
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Pulsed Laser Deposition System

Chongqing Newsin Technology Co., Ltd

Active Member
10 Years
chongqing, chongqing
Since 2007
Business Type :
Manufacturer, Exporter, Trading Company, Seller
Main Products :
APIs, Intermediates, Agrochemicals
Certification Level :
Active Member
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