|
Parameter |
Details |
|
Substrate Compatibility |
Max glass size: 1500×2000mm ~ 2440×3660mm(customizable); Thickness: 1.6-6mm |
|
Ultimate Vacuum |
≤ 8.0×10⁻⁵Pa(coating chamber) |
|
Deposition Rate |
0.5-2.5μm/min(reactive/non-reactive processes) |
|
Target Compatibility |
Ti, Si, Cr, Al, ITO, Nb₂O₅, Si₃N₄(Low-E,AR ) |
|
Production Capacity |
Up to 1.6 million m²/year(single line, 6000 working hours) |
|
Cycle Time |
≥15s/piece(high-speed continuous coating) |
|
Film Uniformity |
±3%(meets ASTMD3359 4B standard) |
1. High-Efficiency Production
◦ Modular multi-chamber design,reduces vacuum pumping time by 30%;
◦ 25% productivity gain via 30mm substrate gap management,low cross-contamination.
1. Precision Coating Quality
◦ Plasma pre-cleaning + RF-ICP auxiliary sputtering,ensures film adhesion(4B grade)and no wavelength shift;
◦ High uniformity(±3%)for functional films(Low-E, solar control, AR),infrared blocking rate ≥90%.
1. Intelligent & Flexible Adaptation
◦ PC+PLC automatic control,real-time process monitoring;
◦ Customizable for curved/2D/3D glass(e.g., sunroof, windshield),quick target/material switching.
1. Energy-Saving & Cost-Effective
◦ Maglev turbo-molecular pumps + optimized vacuum system,reduces energy consumption by 15-20%;
◦ Rotating cathode design,target utilization rate ≥75%(30% higher than traditional planar targets).