Magnetron Sputtering Coating Automotive Glass Production Line
Core Product Specifications
| Parameter |
Details |
| Substrate Compatibility |
Max glass size: 1500×2000mm ~ 2440×3660mm (customizable); Thickness: 1.6-6mm |
| Ultimate Vacuum |
≤ 8.0×10⁻⁵Pa (coating chamber) |
| Deposition Rate |
0.5-2.5μm/min (reactive/non-reactive processes) |
| Target Compatibility |
Ti, Si, Cr, Al, ITO, Nb₂O₅, Si₃N₄ (Low-E, AR) |
| Production Capacity |
Up to 1.6 million m²/year (single line, 6000 working hours) |
| Cycle Time |
≥15s/piece (high-speed continuous coating) |
| Film Uniformity |
±3% (meets ASTMD3359 4B standard) |
Key Selling Points
High-Efficiency Production
- Modular multi-chamber design reduces vacuum pumping time by 30%
- 25% productivity gain via 30mm substrate gap management with low cross-contamination
Precision Coating Quality
- Plasma pre-cleaning + RF-ICP auxiliary sputtering ensures film adhesion (4B grade) and no wavelength shift
- High uniformity (±3%) for functional films (Low-E, solar control, AR) with infrared blocking rate ≥90%
Intelligent & Flexible Adaptation
- PC+PLC automatic control with real-time process monitoring
- Customizable for curved/2D/3D glass (sunroof, windshield) with quick target/material switching
Energy-Saving & Cost-Effective
- Maglev turbo-molecular pumps + optimized vacuum system reduces energy consumption by 15-20%
- Rotating cathode design achieves target utilization rate ≥75% (30% higher than traditional planar targets)