MachineU > China Products > Machinery > Cleaning Equipment > Industrial Ultrasonic Cleaner
Semiconductor Wafer Ultrasonic Cleaning Machine
Semiconductor Wafer Ultrasonic Cleaning Machine
Specifications
Description

Core Features: Ultrasonic frequency 80kHz-170kHz for high-frequency precision cleaning, power 300W-1500W with precise power control, tank made of high-purity stainless steel 316L with PFA coating; supports liquid immersion megasonic-assisted cleaning, temperature control accuracy ±0.5°C, time control accuracy ±1 second, compatible with Class 100 (ISO 14644) cleanroom environment, compliant with RoHS/REACH certification, specifically designed for high-precision electronic components such as semiconductor wafers and chips.

Product Advantages: The semiconductor wafer ultrasonic cleaner achieves micron-level particle removal, 170kHz high frequency avoids damaging the wafer surface, PFA coating prevents secondary contamination; megasonic-assisted technology ensures ≥99% removal rate of submicron contaminants, compatible with the entire semiconductor manufacturing process, and is a key cleaning device for improving wafer yield and ensuring chip performance.

Send your message to this supplier
Send Now

Semiconductor Wafer Ultrasonic Cleaning Machine

Ask Latest Price
Product Detail
Contact Supplier
Semiconductor Wafer Ultrasonic Cleaning Machine

Changzhou Tianyi Electronic Equipment Co., Ltd.

Site Member
1 Years
Since 2004
Business Type :
Manufacturer
Main Products :
Application Scenarios, Number of Tanks, Automation Level
Total Annual :
4000000-5000000
Employee Number :
50~100
Certification Level :
Site Member
Discover similar products
View More

Find Similar Products By Category:

Supplier Homepage Products Application Scenarios
MachineU China Products Machinery Cleaning Equipment Industrial Ultrasonic Cleaner
Contact Supplier
Submit Requirement