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(202994)
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Plasma Etching
Mar 26, 2026
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Product Description: High Purity Welded Quartz Chamber to Generate RF Plasma for ICP, CCP Etching Equipment A quartz chamber in plasma etching is a vacuum vessel, often made with electric fused natural quartz, where ...
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High Purity Welded Quartz Chamber To Generate RF Plasma For ICP, CCP Etching Equipment
>180ea per month
5ea or negotiable
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Nantong Jingcai Precision Co., Ltd.
Verified Supplier
1
Years
Replace a batch
High Purity Quartz Cover Ring Protecting Wafer Edges Preventing Contamination in
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Semiconductors Quartz Moving Ring Providing Wafer Surface Protection, Stability
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12 inch Cover, Quartz Clamp Ring, 300mm W/O/Hole for CCP Dry Plasma Etching
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Quartz 93-30131B Insert Ring, NM 200mm eMAX for Wafer-Level Etching Reaction
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High Purity Durable Ceiling Support Ring, C08 for Holding and Fixing Wafer
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