Specifications
Brand Name :
ZMSH
Model Number :
4 inch
Place of Origin :
China
MOQ :
10
Price :
5 USD
Payment Terms :
T/T
Supply Ability :
By case
Delivery Time :
4-8 weeks
Packaging Details :
custom cartons
Grade :
Zero MPD Grade,Production Grade,Research Grade,Dummy Grade
Resistivity 4H-N :
0.015~0.028 Ω•cm
Resistivity 4/6H-SI :
≥1E7 Ω·cm
Primary Flat :
{10-10}±5.0° or round shape
TTV/Bow /Warp :
≤10μm /≤10μm /≤15μm
Roughness :
Polish Ra≤1 nm / CMP Ra≤0.5 nm
Description

SiC Epitaxial Wafer Overview

8-inch (200 mm) SiC Epitaxial Wafers are now emerging as the most advanced form factor in the SiC industry. Representing the cutting edge of material science and manufacturing capability, 8” SiC epitaxial wafers offer unparalleled opportunities for scaling up power device production while driving down the cost per device.

As demand for electric vehicles, renewable energy, and industrial power electronics continues to surge globally, 8” wafers are enabling a new generation of SiC MOSFETs, diodes, and integrated power modules with higher throughput, better yield, and lower manufacturing costs.

With wide bandgap properties, high thermal conductivity, and exceptional breakdown voltage, 8” SiC wafers are unlocking new levels of performance and efficiency in advanced power electronics.

8-Inch SiC Epitaxial Wafers  Yield and Efficiency Scalable Power Electronics8-Inch SiC Epitaxial Wafers  Yield and Efficiency Scalable Power Electronics


How 8” SiC Epitaxial Wafers Are Made

Manufacturing 8” SiC epitaxial wafers requires next-generation CVD reactors, precise crystal growth control, and ultra-flat substrate technology:

  1. Substrate Fabrication
    Monocrystalline 8” SiC substrates are produced via high-temperature sublimation techniques and subsequently polished to sub-nanometer roughness.

  2. CVD Epitaxial Growth
    Advanced large-scale CVD tools operate at ~1600 °C to deposit high-quality SiC epitaxial layers onto the 8” substrates, with optimized gas flow and temperature uniformity to handle the larger area.

  3. Tailored Doping
    N-type or P-type doping profiles are created with high uniformity across the entire 300 mm wafer.

  4. Precision Metrology
    Uniformity control, crystal defect monitoring, and in-situ process management ensure consistency from wafer center to edge.

  5. Comprehensive Quality Assurance
    Each wafer is validated via:

    • AFM, Raman, and XRD

    • Full-wafer defect mapping

    • Surface roughness and warp analysis

    • Electrical property measurements


Specifications

Grade 8InchN-typeSiCSubstrate
1 Polytype -- 4HSiC
2 ConductivityType -- N
3 Diameter mm 200.00±0.5mm
4 Thickness um 700±50µm
5 CrystalSurfaceOrientationAxis degree 4.0°toward±0.5°
6 Notchdepth mm 1~1.25mm
7 Notchorientation degree ±5°
8 Resistivity(Average) Ωcm NA
9 TTV um NA
10 LTV um NA
11 Bow um NA
12 Warp um NA
13 MPD cm-2 NA
14 TSD cm-2 NA
15 BPD cm-2 NA
16 TED cm-2 NA
17 EPD cm-2 NA
18 ForeignPolytypes -- NA
19 SF(BSF)(2x2mmgridsize) % NA
20 TUA(TotalUsableArea)(2x2mmgridsize) % NA
21 NominalEdgeExclusion mm NA
22 Visualscratches -- NA
23 Scratches-cumulativelength(SiSurface) mm NA
24 SiFace -- CMPpolished
25 CFace -- CMPpolished
26 Surfaceroughness(Siface) nm NA
27 Surfaceroughness(Cface) nm NA
28 lasermarking -- CFace,abovetheNotch
29 Edgechip(Front&backSurfaces) -- NA
30 Hexplates -- NA
31 Cracks -- NA
32 Particle(≥0.3um) -- NA
33 Areacontamination(stains) -- None:Bothfaces
34 ResidualMetalsContamination(ICP-MS) atom/cm2 NA
35 EdgeProfile -- Chamfer,R-Shape
36 Packaging -- Multi-waferCassetteOrSingleWaferContainer


Applications

8” SiC epitaxial wafers enable mass production of reliable power devices in sectors including:

  • Electric Vehicles (EVs)
    Traction inverters, onboard chargers, and DC/DC converters.

  • Renewable Energy
    Solar string inverters, wind power converters.

  • Industrial Drives
    Efficient motor drives, servo systems.

  • 5G / RF Infrastructure
    Power amplifiers and RF switches.

  • Consumer Electronics
    Compact, high-efficiency power supplies.


Frequently Asked Questions (FAQ)

1. What is the benefit of 8” SiC wafers?
They significantly reduce production cost per chip through increased wafer area and process yield.

2. How mature is 8” SiC production?
8” is entering pilot production with select industry leaders—our wafers are available now for R&D and volume ramp.

3. Can doping and thickness be customized?
Yes, full customization of doping profile and epi thickness is available.

4. Are existing fabs compatible with 8” SiC wafers?
Minor equipment upgrades are needed for full 8” compatibility.

5. What is typical lead time?
6–10 weeks for initial orders; shorter for repeat volumes.

6. What industries will adopt 8” SiC fastest?
Automotive, renewable energy, and grid infrastructure sectors.


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8-Inch SiC Epitaxial Wafers Yield and Efficiency Scalable Power Electronics

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Brand Name :
ZMSH
Model Number :
4 inch
Place of Origin :
China
MOQ :
10
Price :
5 USD
Payment Terms :
T/T
Contact Supplier
8-Inch SiC Epitaxial Wafers  Yield and Efficiency Scalable Power Electronics
8-Inch SiC Epitaxial Wafers  Yield and Efficiency Scalable Power Electronics
8-Inch SiC Epitaxial Wafers  Yield and Efficiency Scalable Power Electronics

SHANGHAI FAMOUS TRADE CO.,LTD

Verified Supplier
7 Years
shanghai, shanghai
Since 2013
Business Type :
Manufacturer, Agent, Importer, Exporter, Trading Company
Total Annual :
1000000-1500000
Certification Level :
Verified Supplier
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