Insulation Performance Alumina Ceramic Bases For Precision Measurement Equipment And Industrial Inspection

These alumina ceramic support bases are manufactured using 99.6% high-purity Al₂O₃ material, specifically designed for semiconductor, optical, and precision measurement equipment. Featuring ultra-high flatness of 0.01mm/m and a thermal expansion coefficient of 7.2×10⁻⁶/℃, the products maintain exceptional dimensional stability in extreme temperatures (-60℃~1500℃) and vacuum environments (≤10⁻⁸Pa).

Core Application Fields

• Semiconductor Equipment: Lithography wafer stages, etching reactor chamber bases

• Precision Optics: Laser interferometer reference platforms, space telescope mirror mounts

• Analytical Instruments: Electron microscope sample stages, mass spectrometer ion source supports

• Industrial Inspection: CMM machine bases, roundness tester turntables

• New Energy: Fuel cell stack supports, photovoltaic coating equipment carriers

Performance Advantage Matrix

Technical Specifications

Precision Manufacturing Process

1. Powder Processing: 0.1μm high-purity powder with spray granulation

2. Forming Process: Isostatic pressing (300MPa) combined with CNC green machining

3. Sintering Technology: Gradient sintering at 1700℃ in hydrogen atmosphere

4. Precision Machining:

   • 5-axis grinding (±0.002mm)

   • Magnetorheological polishing (surface accuracy λ/20@632.8nm)

5. Cleanroom Processing: Assembly completed in Class 100 cleanroom

6. Full Inspection: Laser interferometer + CMM complete dimensional inspection

Installation Guidelines

• Installation Requirements:
  ✓ Use torque wrench (recommended value 1.5±0.2N·m)
  ✓ Use dedicated cleanroom tools
  ✓ Recommended thermal matching pre-adjustment (temperature gradient <2℃/min)

• Environmental Limitations:
  ✗ Avoid contact with hydrofluoric acid
  ✗ Avoid thermal shocks >200℃/min
  ✗ Not suitable for continuous >1600℃ oxidizing environments

Service Commitment

• Technical Support: Free FEA stress analysis

• Rapid Response: 72-hour expedited service

• Traceability Management: 10-year complete production records

• Certification Support: SEMI/FDA/ISO certification documents provided

FAQ

Q: How to ensure thermal matching with silicon carbide components?
A: CTE gradient transition design available (adjustable 7.2-4.5×10⁻⁶/℃)

Q: Maximum processable dimensions?
A: Current technical limit 500×500×100mm (special tooling required)

Q: Is conductive modification supported?
A: Customizable antistatic versions with surface resistance 10⁴-10¹⁰Ω

Q: How is wafer-level cleanliness guaranteed?
A: Final sterilization with VHP (vaporized hydrogen peroxide)