Alumina Products Customized For High-Temperature And Corrosion-Resistant Components

Our high-precision alumina ceramic components utilize ultra-pure Al₂O₃ material (≥99.6% purity) specifically engineered for precision instrumentation applications. Featuring nanometer-level surface finish (Ra≤0.05μm) and micron-level dimensional accuracy (±0.005mm), these components meet the most demanding requirements in semiconductor equipment, optical instruments, and medical devices.

Key Applications

• Semiconductor Manufacturing: Wafer handling arms, vacuum chamber liners, plasma nozzles

• Optical Instrumentation: Laser mirror mounts, spectrometer slit assemblies, interferometer reference platforms

• Medical Analysis Equipment: Mass spectrometer ion sources, chromatographic ceramic columns, PCR thermal cycling modules

• Scientific Research: UHV flanges, cryogenic experimental platforms, synchrotron radiation optics

• Industrial Metrology: CMM probe tips, surface profilometer reference blocks, roundness tester turntables

Outstanding Features

✦ Ultra-Precision Machining: Profile accuracy ≤0.1μm, angular tolerance ±5 arcseconds
✦ Exceptional Stability: CTE 7.2±0.1×10⁻⁶/℃ (20-100℃)
✦ Ultra-Clean Surface: Metal ion content <1ppm
✦ Functional Customization: Integrated conductive/insulative/antistatic zones
✦ Environmental Resistance: Radiation tolerance >10⁶Gy, outgassing rate <10⁻¹¹Pa·m³/s

Technical Specifications

Precision Manufacturing Process

1. Ultra-Fine Powder Processing: 50nm alumina powder spray granulation

2. Isostatic Pressing: 200MPa cold isostatic pressing

3. Atmosphere Sintering: Hydrogen atmosphere sintering at 1700℃

4. Ultra-Precision Machining: 5-axis slow wire EDM + diamond grinding

5. Cleanroom Processing: Class 100 ultrasonic cleaning

6. Full Inspection: White light interferometry + CMM complete dimensional verification

Usage & Maintenance

▷ Use dedicated cleanroom tools and ESD gloves during installation
▷ Recommended operating temperature: -60℃ to 450℃
▷ Avoid strong corrosive media (HF, hot phosphoric acid, etc.)
▷ Plasma cleaning recommended every 500 operating hours
▷ Storage conditions: 22±1℃, 45±5% RH

Service Commitment
✔ Free application technical consulting
✔ 72-hour rush order service
✔ 10-year product performance traceability
✔ Cleanroom packaging + nitrogen purge shipping options

Technical FAQ

Q: Can you meet ISO-10110 optical surface standards?
A: Capable of λ/20@632.8nm optical flatness

Q: Do you offer conductive ceramic solutions?
A: Customizable surface resistance 10⁴-10¹⁰Ω

Q: Maximum single-piece dimensions?
A: Current capability 300×300×50mm (larger assemblies available)

Q: How is UHV performance guaranteed?
A: Special sintering process achieves lower outgassing than most metals