Precision Perforated Quartz Plate High Purity Fused Silica

This precision perforated quartz plate is manufactured from high purity fused silica with double-sided fine grinding. Featuring precisely uniform holes with clean edges and no chipping, it delivers 1100°C heat resistance and superior HF and strong acid/alkali chemical durability. Ideal for tube furnace gas diffusion baffles, vacuum coating workpiece fixtures, semiconductor sintering carriers and chemical laboratory filter plates.

Product Parameters

Key Features

• Precision Perforated Holes – Uniform hole pattern with clean edges and no chipping, ensuring consistent gas flow and reliable mechanical performance.
• Double Side Fine Ground – Both surfaces precision ground for superior flatness and uniform thickness, ensuring stable workpiece support and gas distribution.
• 1100°C Heat Resistance – Maintains structural integrity and dimensional stability under sustained high-temperature operation in tube furnace and sintering applications.
• HF & Strong Chemical Resistance – Superior to borosilicate glass, withstands hydrofluoric acid and concentrated acids/alkalis for chemical processing applications.
• High Purity, No Contamination – 99.99% pure fused silica with zero impurity precipitation, preventing sample contamination in semiconductor and high-purity processes.

Applications

1. Tube Furnace Gas Baffle

Gas-permeable separator plate supporting powder materials while balancing protective gas flow distribution within tube furnace environments for uniform heat treatment.

2. Vacuum Coating Fixture

Workpiece positioning carrier with through-holes allowing process gas circulation during vacuum thin-film deposition, ensuring uniform coating coverage.

3. Semiconductor Sintering Carrier

Gas-permeable support plate for semiconductor material sintering, enabling impurity outgassing and uniform atmosphere exposure during high-temperature processing.

4. Chemical Laboratory Filter Plate

Corrosion-resistant filter separator and reaction gas-permeable support plate for chemical laboratory applications involving aggressive reagents.

Advantages over Borosilicate Glass

Unlike borosilicate glass perforated plates that are attacked by HF and soften at high temperatures, this fused silica plate offers full HF resistance, sustained 1100°C operation, excellent thermal shock resistance without cracking, and high purity with zero contamination—making it the superior choice for demanding high-temperature, corrosive and high-purity applications.