Product Overview

The High Purity Fused Silica Quartz Substrate is a precision-ground quartz glass plate (180mm x 15mm x 5mm) designed for high-end semiconductor, optical coating, photovoltaic, and laboratory applications. Manufactured from premium fused silica (SiO2 > 99.99%), this substrate delivers exceptional thermal stability, chemical inertness, and optical clarity — making it the preferred choice for demanding high-precision manufacturing environments.

Key Features

• Ultra-High Purity: SiO2 > 99.99% with ultra-low metal impurity content. No ion precipitation ensures contamination-free processing for semiconductor and optical applications
• 1100°C Temperature Resistance: Withstands extreme heat without deformation or degradation, far surpassing borosilicate glass alternatives
• HF & Strong Corrosive Resistance: Excellent chemical durability against hydrofluoric acid, strong acids, and alkalis — ideal for aggressive wet chemical processes
• Ultra-Low Thermal Expansion: CTE of 5.5 x 10^-7 /°C prevents cracking and warping under rapid temperature cycling
• High Transmittance: > 92% transmission across UV to visible spectrum, perfect for optical coating and photolithography applications
• Precision Surface Finish: Precision ground and polished surfaces ensure flatness and uniform coating deposition

Applications

Competitive Advantages

vs. Borosilicate Glass: Withstands over 1100°C vs ~500°C limit; superior HF acid resistance; 10x lower thermal expansion prevents cracking; ultra-low metal impurity eliminates process contamination risk

vs. Alumina Ceramic: High optical transparency for UV-visible applications; smoother surface finish for uniform coating; lighter weight and easier precision machining

Specifications