The Thickened 9-inch Wafer Calibration Glass Plate is a precision optical reference substrate engineered for semiconductor wafer dimension, appearance and flatness inspection. Manufactured from high-transmittance fused silica or alkali-free borosilicate glass, this calibration plate matches the standard 9-inch wafer dimension while offering a customized thickened structure that resists bending and warpage during repeated inspection cycles. The double-sided ultra-precision polished surfaces deliver optical-grade flatness and parallelism, providing a stable geometric baseline for automated optical inspection systems. As a dedicated calibration reference, the plate ensures that measurement data remains consistent and repeatable across long production runs, making it an essential tool for wafer fabrication, lithography alignment and optical image measurement applications.
Specification| Parameter | Specification |
|---|---|
| Size | 9-inch, matching standard wafer dimension |
| Thickness | Customized thickened design |
| Material | High-transmittance fused silica / alkali-free borosilicate glass (optional) |
| Surface Finish | Double-sided ultra-precision optical polishing |
| Flatness & Parallelism | Optical reference grade |
| Edge Treatment | Precision chamfered, chipping-free |
| Application | Wafer dimension, appearance and flatness inspection |
The Thickened 9-inch Wafer Calibration Glass Plate serves as a versatile optical reference in semiconductor manufacturing and inspection environments. It is widely used for 9-inch silicon wafer dimension calibration, providing a trusted geometric standard that verifies the accuracy of measurement tools. In wafer flatness inspection, the optical-grade surface acts as a reliable reference baseline for comparing surface uniformity and detecting deviation. The plate also functions as a standard carrier for optical image measuring instruments, supporting consistent positioning during dimensional analysis. In lithography equipment, it works as an alignment calibration plate that helps maintain precise pattern registration. Additionally, the plate is adopted as a fixture base for wafer surface defect inspection, offering a flat, stable and contamination-free platform for automated defect detection systems.
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