The Fused Silica Ring is a large precision ring component with an outer diameter of 288mm, an inner diameter of 272mm and a thickness of 28mm, integrally formed from high-purity fused silica. The flat ring surface is free of chipping, bubbles and interlayers, providing a clean and reliable sealing and support face. With high transmittance from UV to IR, an ultra-low thermal expansion coefficient and resistance to temperatures above 1100 degrees Celsius, the ring withstands extreme thermal conditions without cracking. Its strong resistance to acid and alkali, combined with excellent insulation, makes it a dependable component for furnace sealing, semiconductor equipment and optical instrumentation.
Specification| Parameter | Specification |
|---|---|
| Outer Diameter | 288mm |
| Inner Diameter | 272mm |
| Thickness | 28mm |
| Material | High-purity fused silica, integrally formed |
| Surface | Flat ring surface, free of chipping and bubbles |
| Temperature Resistance | Above 1100 degrees Celsius |
| Customization | Double-side polishing, slotting, drilling |
The Fused Silica Ring is designed for high-temperature and precision industrial systems that require stable ring-shaped components. It is widely used as a high-temperature furnace sealing spacer, maintaining a clean seal in thermal processing equipment. In semiconductor manufacturing, the ring serves as a carrier ring for semiconductor equipment, supporting wafers and components at elevated temperatures. The component is also adopted as a flange gasket for optical instruments, providing a stable, contamination-free interface. In coating systems, it functions as a fixture part for coating machines, holding workpieces during deposition. Additionally, the ring works as a high-temperature isolation ring for industrial observation, combining optical transparency with thermal durability.
Advantages