Porosity Graphite
High-porosity graphite featuring exceptional strength, narrow aperture distribution, and uniform microstructure. This material is widely utilized in semiconductor manufacturing, battery technology, catalyst systems, hydrogen storage applications, and advanced adsorption materials.
Semiconductor Industry Applications & Crystal Quality Enhancement
- Adjusts C/Si ratio to minimize phase transition probability
- Filters impurities to enhance crystal quality
- Provides superior temperature uniformity in raw material zones
- Maintains consistent airflow rates during crystal growth processes
- Improves crystal morphology and prevents edge polycrystallization
Technical Specifications
| Grade |
Bulk Density (g/cm³) |
Electric Resistivity (μΩ·m) |
Compressive Strength (MPa) |
Flexural Strength (MPa) |
Thermal Conductivity W/(m·K) |
Coefficient of Thermal Expansion (*10⁻⁶/°C) |
Porosity (%) |
Closed Porosity (%) |
Average Grain Size (μm) |
| CTL04K |
1.1 |
40 |
32 |
14.5 |
30 |
5.5 |
46 |
1.5 |
55 |
| CTL05K |
1.2 |
30 |
40 |
19 |
40 |
5.5 |
45 |
2 |
40 |
| CTL06K |
0.9 |
100 |
22 |
9.5 |
25 |
6.7 |
50 |
1.5 |
80 |
Primary Applications
Semiconductor manufacturing, Aerospace components, New energy systems, Air flotation technology, Catalyst support structures, and advanced industrial applications.