Silicon Carbide (SiC) Furnace Components | Paddles, Boats & Tubes for Semiconductor & Solar
Our Silicon Carbide (SiC) Furnace Components provide advanced ceramic solutions for demanding semiconductor and solar manufacturing processes. Engineered to withstand extreme temperatures up to 1900°C, these high-purity components deliver superior thermal shock resistance, exceptional mechanical strength, and contamination-free performance - offering significantly longer service life and higher throughput compared to traditional quartz alternatives.
Core Product Line & Applications
- SiC Paddle: Robust wafer boat holder for diffusion processes
- SiC Boat: Wafer carrier for boron/phosphorus diffusion in discrete semiconductor manufacturing
- SiC Dragon Wafer Boat: Specialized holder for high-temperature diffusion applications
- SiC Process Tube: Critical component for diffusion furnace systems
Key Technical Advantages
- Extreme Temperature Performance: Maintains structural integrity and chemical stability at 1900°C operating temperatures
- Superior Mechanical Properties: High flexural strength (up to 420 MPa) prevents deformation under heavy thermal loads
- Exceptional Thermal Management: Outstanding thermal shock resistance ensures reliability during rapid thermal cycling
- Ultra-High Purity Construction: Resists acid/alkali corrosion, preventing wafer contamination in sensitive processes
- Optimized Thermal Conductivity: Ensures uniform temperature distribution for consistent process results
Technical Performance Specifications
| Performance Parameter |
UNIT |
HS-A |
HS-P |
HS-XA |
| Grain Size |
μm |
4-10 |
4-10 |
4-10 |
| Density |
g/cm³ |
≥3.1 |
3.0-3.1 |
>3.1 |
| Hardness (Knoop) |
Kg/mm² |
2800 |
2800 |
2800 |
| Flexural Strength @ RT |
MPa |
385 |
240 |
420 |
| Compressive Strength @ RT |
MPa |
3900 |
- |
3900 |
| Modulus of Elasticity @ RT |
GPa |
410 |
400 |
410 |
| Fracture Toughness @ RT |
MPa*m¹/² |
8 |
8 |
8 |
| Max. Service Temp. (Air) |
°C |
1900 |
1900 |
1900 |
| Thermal Conductivity @ RT |
W/m*K |
125.6 |
110 |
125.6 |
Primary Industrial Applications
- Semiconductor Manufacturing: Diffusion, CVD, and high-temperature processing
- LED Production: Epitaxial growth and wafer processing applications
- Solar Energy: Photovoltaic cell diffusion furnace systems
- Discrete Power Devices: Boron and phosphorus diffusion processes
Competitive Advantages
- Quality Assurance: Rigorous quality control ensures consistent performance across all batches
- Custom Engineering: Expertise in manufacturing components to precise customer specifications
- Reliable Delivery: Efficient production systems designed to meet critical project timelines
- Technical Support: Comprehensive application engineering and customer service