Product Description

Trimethylaluminum (TMA), also known as aluminium trimethyl, is an organometallic compound with the chemical formula Al(CH3)3. It is a pyrophoric liquid that is colorless and has a strong, unpleasant odor. TMA is highly reactive and primarily used as a precursor in various chemical processes, particularly in the semiconductor industry for the deposition of thin films.

Here are some key properties and applications of trimethylaluminum:

Properties:

1. Chemical Formula: Al(CH3)3
2. Molecular Weight: 90.1 g/mol
3. Boiling Point: 125-126°C (257-259°F)
4. Melting Point: -93°C (-135°F)
5. Density: 0.777 g/cm³ at 20°C (68°F)

Applications:

1. Chemical Vapor Deposition (CVD): TMA is widely used in the semiconductor industry as a precursor in the chemical vapor deposition process to deposit thin films of aluminum compounds, such as aluminum oxide (Al2O3), onto substrates. These films are essential for the fabrication of microelectronic devices.
2. Atomic Layer Deposition (ALD): TMA is also utilized in atomic layer deposition, a technique that enables precise and conformal deposition of ultra-thin films. TMA is often combined with other precursors to deposit high-quality aluminum-containing films.
3. Catalysis: Trimethylaluminum can act as a catalyst or co-catalyst in various organic reactions, such as polymerization and hydroformylation processes.
4. Flame Retardants: TMA is sometimes used as a flame retardant additive in certain polymers to improve their fire resistance properties.
5. Research and Development: TMA is employed in research laboratories for exploring new synthetic routes, developing new materials, and studying organometallic chemistry.

It's important to note that trimethylaluminum is highly flammable and reacts violently with air and water. Proper safety precautions, including handling in a well-ventilated area and using specialized equipment, are necessary when working with this compound.