3-inch SGGG Wafer, Substituted Gadolinium Gallium Garnet, (111) Orientation, EPI Polished, Faraday Rotator Substrate for 400G/800G Optical Module Isolators
The 3-inch SGGG epitaxial substrate is the mainstream specification for Faraday rotator mass production in the optical communications industry. With a diameter of 76.2 mm, standard thickness of 630 ± 30 μm, and (111) orientation, it uses in-house grown large-size SGGG single crystal. Precision-processed and EPI-grade super-smooth polished, it achieves Ra ≤ 1 nm, dislocation density ≤ 10 cm⁻², and TTV ≤ 6 μm, ready for batch LPE growth of BIG/Bi:YIG magneto-optical films.
The product features a primary flat ([-110]) and secondary flat ([-1-12]) for precise alignment in epitaxy equipment and subsequent dicing processes. Each batch undergoes full-parameter inspection including lattice constant, orientation, surface particle count, and bow, ensuring high consistency. It is the cost-effective choice for mass production of Faraday rotators for 400G/800G optical module isolators and circulators.
Key Functions
BIG/YIG film LPE epitaxy:
Precisely matched lattice constant with bismuth iron garnet films, ensures epitaxial layer uniformity and magneto-optical performance
Faraday rotator mass-production substrate:
3-inch is the current mainstream size for optical communication rotator production, yielding tens to hundreds of rotator chips per wafer
Core upstream of isolators/circulators:
The rotator chip is the "heart" of optical isolators; SGGG substrate is its foundation
Typical Applications
400G/800G optical module isolators
Faraday rotator chip mass production
BIG/Bi:YIG magneto-optical film LPE
Optical circulators and switches
Fiber amplifier ASE noise suppression
Magneto-optical sensors and current transformers