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High Purity Graphite Sputtering Target Hot Pressing Sintering Process
High Purity Graphite Sputtering Target Hot Pressing Sintering Process
High Purity Graphite Sputtering Target Hot Pressing Sintering Process
High Purity Graphite Sputtering Target Hot Pressing Sintering Process
Specifications
Brand Name :
APG
Place of Origin :
china
Certification :
ISO9001、ISO14001、ISO45001、IAFT16949
Packaging Details :
Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time :
4-5 weeks
Payment Terms :
T/T
Supply Ability :
Stable supply
Purity :
99.99%
Relative density :
≥99%
Name :
Graphite Target (C)
Forming Process :
Hot Pressing Sintering
Product Specifications :
Flat Targets, Rotary Targets
Application Fields :
Semiconductor Manufacturing, Optical Device Component Manufacturing, Photovoltaic Industry,Aerospace
Description

Engineered from high-purity graphite, the graphite targets exhibit exceptional thermal stability, superior heat resistance, and a low coefficient of thermal expansion. These targets are critical for depositing high-performance carbon films in sectors such as semiconductors, photovoltaics, and advanced battery materials, where maintaining material integrity during high-temperature processing is paramount.

Outstanding Features of Graphite Target

l High Thermal Stability

It maintains stable performance in high-power, high-temperature sputtering processes, ensuring uniform film deposition.

l Low Thermal Expansion Coefficient

It is dimensionally stable under temperature changes, reducing deposition stress and enhancing the film's density and adhesion.

l Excellent Electrical Conductivity


Graphite targets have good electrical conductivity, making them suitable for the preparation of electronic devices, functional films, and conductive layers.

Wide Applications of Graphite Target

l Semiconductor Manufacturing


Graphite targets are used for preparing conductive films, carbon barrier layers, and interconnect layers, ensuring high performance and stability of devices.

l Optical Component Manufacturing


Used for preparing carbon films, anti-reflection coatings, and infrared absorption films, widely applied in optical components, laser devices, and infrared windows.

l Photovoltaic Industry


Used in photovoltaic cell back electrodes, fuel cell carbon layers, and supercapacitor conductive layers, enhancing energy conversion efficiency and device lifespan.

l Aerospace


Films deposited by graphite targets can serve as high-temperature protective coatings, improving heat resistance and wear resistance.

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High Purity Graphite Sputtering Target Hot Pressing Sintering Process

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Product Detail
Brand Name :
APG
Place of Origin :
china
Certification :
ISO9001、ISO14001、ISO45001、IAFT16949
Packaging Details :
Vacuum-sealed packaging, case-packed for storage and transport
Delivery Time :
4-5 weeks
Payment Terms :
T/T
Contact Supplier
High Purity Graphite Sputtering Target Hot Pressing Sintering Process
High Purity Graphite Sputtering Target Hot Pressing Sintering Process

Shenzhen APG Material Company Limited

Verified Supplier
1 Years
shenzhen
Main Products :
Sputtering Target Material, Ceramic Targets, Metal Sputtering Target
Certification Level :
Verified Supplier
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